TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
    1.
    发明申请

    公开(公告)号:US20160029471A1

    公开(公告)日:2016-01-28

    申请号:US14874164

    申请日:2015-10-02

    CPC classification number: H05G2/008 G21K5/02 H01S3/10 H05G2/005

    Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Patent Agency Ranking