公开(公告)号：US10088756B2

公开(公告)日：2018-10-02

申请号：US15321184

申请日：2015-06-04

Applicant: ASML Netherlands B.V.

Inventor： Sander Kerssemakers ,  Wilhelmus Petrus De Boeij ,  Gerben Frank De Lange ,  Christiaan Alexander Hoogendam ,  Petrus Franciscus Van Gils ,  Jelmer Mattheüs Kamminga ,  Jan Jaap Kuit ,  Carolus Johannes Catharina Schoormans

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.