公开(公告)号：US11506984B2

公开(公告)日：2022-11-22

申请号：US15567606

申请日：2016-05-13

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Rafael C. Howell ,  Jianjun Jia

IPC: G03F7/20 ,  G06F30/367 ,  G06F119/18

Abstract: A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.

公开(公告)号：US10386727B2

公开(公告)日：2019-08-20

申请号：US15126234

申请日：2015-03-03

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Jianjun Jia ,  Xiaofeng Liu ,  Cuiping Zhang

IPC: G03F7/20 ,  G03F1/36

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.