公开(公告)号：US20240231247A1

公开(公告)日：2024-07-11

申请号：US18413910

申请日：2024-01-16

Applicant: ASML Netherlands B.V.

Inventor： Arjan Johannes Anton BEUKMAN ,  Omar EL GAWHARY ,  Ilse VAN WEPEREN ,  Pieter Joseph Marie WÖLTGENS

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7046

Abstract: Disclosed is a method for measuring alignment on an alignment mark, and associated apparatuses. The method comprises illuminating the alignment mark with illumination comprising at least one wavelength; capturing the scattered radiation scattered from the alignment mark as a result of said illumination step, and determining at least one position value for said alignment mark from an angularly resolved representation of said scattered radiation, wherein said alignment mark, or a feature thereof, is smaller than said at least one wavelength in at least one dimension of a substrate plane.