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公开(公告)号：US20220342228A1
公开(公告)日：2022-10-27
申请号：US17764057
申请日：2020-09-27
摘要： A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.
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公开(公告)号：US20220121128A1
公开(公告)日：2022-04-21
申请号：US17565422
申请日：2021-12-29
IPC分类号： G03F7/20
摘要： Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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公开(公告)号：US20230266255A1
公开(公告)日：2023-08-24
申请号：US18012801
申请日：2021-06-09
发明人： Ilse VAN WEPEREN , Arjan Johannes Anton BEUKMAN , Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N2021/95676
摘要： Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号：US20230229094A1
公开(公告)日：2023-07-20
申请号：US18151334
申请日：2023-01-06
发明人： Simon Reinald HUISMAN , Arjan Johannes Anton BEUKMAN , Arie Jeffrey DEN BOEF , Sebastianus Adrianus GOORDEN , Nitish KUMAR , Jin LIAN , Zili ZHOU
CPC分类号： G03F9/7065 , G02B26/0833 , G02B27/283 , G03F7/70575 , G03F7/70616
摘要： Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.
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公开(公告)号：US20240231247A1
公开(公告)日：2024-07-11
申请号：US18413910
申请日：2024-01-16
发明人： Arjan Johannes Anton BEUKMAN , Omar EL GAWHARY , Ilse VAN WEPEREN , Pieter Joseph Marie WÖLTGENS
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7046
摘要： Disclosed is a method for measuring alignment on an alignment mark, and associated apparatuses. The method comprises illuminating the alignment mark with illumination comprising at least one wavelength; capturing the scattered radiation scattered from the alignment mark as a result of said illumination step, and determining at least one position value for said alignment mark from an angularly resolved representation of said scattered radiation, wherein said alignment mark, or a feature thereof, is smaller than said at least one wavelength in at least one dimension of a substrate plane.
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6.发明公开公开(公告)号：US20230213871A1
公开(公告)日：2023-07-06
申请号：US18000087
申请日：2021-05-14
发明人： Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI , Simon Reinald HUISMAN , Johannes Jacobus Matheus BASELMANS , Haico Victor KOK , Mohamed SWILLAM , Arjan Johannes Anton BEUKMAN
CPC分类号： G03F7/70625 , G01B11/272 , G03F9/7049
摘要： A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.
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