公开(公告)号：US20210319977A1

公开(公告)日：2021-10-14

申请号：US17226017

申请日：2021-04-08

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weimin ZHOU ,  Xiaoxue CHEN ,  Xiaoyu JI ,  Heng LI ,  Shahedul HOQUE ,  Zongyao LI ,  Shuhao LIU ,  Weiming REN

IPC: H01J37/28 ,  H01J37/145 ,  H01J37/244 ,  H01J37/147

Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.

公开(公告)号：US20240021404A1

公开(公告)日：2024-01-18

申请号：US18256865

申请日：2021-11-17

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Shahedul HOQUE ,  Xiaoyu JI ,  Hermanus Adrianus DILLEN

IPC: H01J37/147

CPC classification number: H01J37/1478 ,  H01J37/1477 ,  H01J2237/1507 ,  H01J37/28

Abstract: Systems and methods of imaging a sample using a tilted charged-particle beam. The apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged-particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.

公开(公告)号：US20250037967A1

公开(公告)日：2025-01-30

申请号：US18911806

申请日：2024-10-10

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weimin ZHOU ,  Xiaoxue CHEN ,  Xiaoyu JI ,  Heng LI ,  Shahedul HOQUE ,  Zongyao LI ,  Shuhao LIU ,  Weiming REN

IPC: H01J37/28 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244

Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.

公开(公告)号：US20230178328A1

公开(公告)日：2023-06-08

申请号：US17913141

申请日：2021-03-18

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Zhonghua DONG ,  Xiaoyu JI ,  Shahedul HOQUE ,  Weiming REN ,  Xuedong LIU ,  Guofan YE ,  Kuo-Chin CHIEN

IPC: H01J37/147

CPC classification number: H01J37/1474 ,  H01J2237/1504

Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.