公开(公告)号：US20180269031A1

公开(公告)日：2018-09-20

申请号：US15926623

申请日：2018-03-20

Applicant: TESCAN Brno s.r.o. ,  TESCAN TEMPE, LLC.

Inventor： Petras Stanislav ,  Lencova Bohumila ,  Benner Gerd Ludwig ,  Jon Karl Weiss

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/244 ,  G01N23/20058

CPC classification number: H01J37/268 ,  G01N23/20058 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J37/2955 ,  H01J2237/1505 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/1508 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope is adapted to acquire high quality precession electron diffraction (PED) patterns by means of separated scanning deflectors and precession deflectors. Magnetic or electrostatic deflectors may be used for scanning and for precession. This enables independent optimization of parameters for each deflection system to achieve a broad operating range simultaneously for both deflection systems.

公开(公告)号：US12106935B2

公开(公告)日：2024-10-01

申请号：US18139184

申请日：2023-04-25

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Rutger Meyer Timmerman Thijssen

IPC: H01J37/305 ,  G02B6/136 ,  H01J37/12 ,  H01J37/147 ,  H01J37/20 ,  G02B6/12

CPC classification number: H01J37/3053 ,  G02B6/136 ,  H01J37/12 ,  H01J37/1478 ,  H01J37/20 ,  H01J37/3056 ,  G02B2006/12107 ,  H01J2237/1507 ,  H01J2237/3174

Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.

公开(公告)号：US20190074158A1

公开(公告)日：2019-03-07

申请号：US15905896

申请日：2018-02-27

Applicant: Toshiba Memory Corporation

Inventor： Tsuyoshi Fujii ,  Takayuki Ito ,  Yasunori Oshima

IPC: H01J37/24 ,  H01J37/317 ,  H01J37/147 ,  H01J37/08 ,  H01J37/20

CPC classification number: H01J37/243 ,  H01J37/08 ,  H01J37/1477 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/1507 ,  H01J2237/20207 ,  H01J2237/30461 ,  H01J2237/31703 ,  H01J2237/3171

Abstract: In one embodiment, an ion implantation apparatus includes an ion source configured to generate an ion beam. The apparatus further includes a scanner configured to change an irradiation position with the ion beam on an irradiation target. The apparatus further includes a first electrode configured to accelerate an ion in the ion beam. The apparatus further includes a controller configured to change at least any of energy and an irradiation angle of the ion beam according to the irradiation position by controlling the ion beam having been generated from the ion source.

公开(公告)号：US09484181B2

公开(公告)日：2016-11-01

申请号：US14760053

申请日：2014-01-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/1478 ,  H01J37/147 ,  H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/221 ,  H01J2237/2806

Abstract: There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens (14) and which includes an optical element (12) having a lens action and a trajectory correcting deflector (10). An applied voltage and an excitation current of the optical element (12) are set to zero after a trajectory correction of a primary charged particle beam (30). Accordingly, the lens action and an aberration of the optical element (12) have no influence on resolution.

Abstract translation: 提供了一种带电粒子束装置，其包括设置在物镜（14）上方并包括具有透镜作用的光学元件（12）和轨迹校正偏转器（10）的轨迹监测单元。 在一次带电粒子束（30）的轨迹校正之后，光学元件（12）的施加电压和激励电流被设置为零。 因此，透镜作用和光学元件（12）的像差对分辨率没有影响。

公开(公告)号：US20060208202A1

公开(公告)日：2006-09-21

申请号：US11145949

申请日：2005-06-07

Applicant: Atul Gupta ,  Joseph Olson

Inventor： Atul Gupta ,  Joseph Olson

IPC: H01J37/302 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/1477 ,  H01J37/3171 ,  H01J2237/1507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/31703 ,  H01L21/26586

Abstract: A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.

Abstract translation: 公开了一种用于离子束角度扩展控制的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于离子束角度扩展控制的方法。 该方法可以包括以两个或更多个不同的入射角度在衬底表面处引导一个或多个离子束，从而将衬底表面暴露于受控的离子束入射角扩散。

公开(公告)号：US20240021404A1

公开(公告)日：2024-01-18

申请号：US18256865

申请日：2021-11-17

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Shahedul HOQUE ,  Xiaoyu JI ,  Hermanus Adrianus DILLEN

IPC: H01J37/147

CPC classification number: H01J37/1478 ,  H01J37/1477 ,  H01J2237/1507 ,  H01J37/28

Abstract: Systems and methods of imaging a sample using a tilted charged-particle beam. The apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged-particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.

公开(公告)号：US09406496B2

公开(公告)日：2016-08-02

申请号：US13681245

申请日：2012-11-19

Applicant: Universitat de Barcelona ,  Nanomegas SPRL ,  AppFive LLC

Inventor： Sonia Estrade Albiol ,  Joaquin Portillo Serra ,  Francisca Peiró Martinez ,  José Manuel Rebled Corsellas ,  Lluís Yedra Cardona ,  Stavros Nicolopoulos ,  Steven Kim ,  Jon Karl Weiss

IPC: G01N23/225 ,  H01J49/44 ,  H01J37/28

CPC classification number: H01J49/44 ,  G01N23/2251 ,  G01N2223/051 ,  G01N2223/402 ,  H01J37/28 ,  H01J2237/1505 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/2808

Abstract: A method and system are disclosed for improving characteristic peak signals in electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) measurements of crystalline materials. A beam scanning protocol is applied which varies the inclination, azimuthal angle, or a combination thereof of the incident beam while spectroscopic data is acquired. The method and system may be applied to compositional mapping.

Abstract translation: 公开了用于改善电子能量损失光谱（EELS）中的特征峰值信号和结晶材料的能量色散X射线光谱（EDS）测量的方法和系统。 应用波束扫描协议，其在获取光谱数据的同时改变入射光束的倾斜度，方位角或其组合。 该方法和系统可以应用于组合映射。

公开(公告)号：US6028662A

公开(公告)日：2000-02-22

申请号：US320534

申请日：1999-05-26

Applicant: Maris A. Sturans ,  Rodney A. Kendall

Inventor： Maris A. Sturans ,  Rodney A. Kendall

IPC: G01Q30/00 ,  G01R31/307 ,  H01J37/304 ,  H05H1/00 ,  G01J1/00 ,  G01B11/26

CPC classification number: H05H1/0006 ,  G01R31/307 ,  H01J37/304 ,  H01J2237/1507 ,  H01J2237/3175

Abstract: The invention relates to a method and apparatus for measuring The landing angle of a particle beam is adjusted by scanning the beam over two cylindrical beam target surfaces that are positioned close to the system axis. The output of a beam detector is differentiated and displayed on an oscilloscope. The relevant lens current is adjusted until one side of the scan indicates that the focal plane of the beam is at the center of the beam target. The angle of the beam is then adjusted with the relevant deflector until both sides of the scan are the same, indicating that the beam is accurately vertical.

Abstract translation: 本发明涉及一种用于测量的方法和装置。通过在靠近系统轴线定位的两个圆柱形射束目标表面上扫描光束来调整粒子束的着陆角。 光束检测器的输出被差分并显示在示波器上。 调整相关镜头电流，直到扫描的一侧指示光束的焦平面位于光束目标的中心。 然后用相关偏转器调整光束的角度，直到扫描的两侧相同，表明光束是准确垂直的。

公开(公告)号：US5285074A

公开(公告)日：1994-02-08

申请号：US893172

申请日：1992-06-03

Applicant: Don F. Haire ,  Cecil T. Ho ,  Guenther O. Langner ,  Werner Stickel ,  Edward V. Weber

Inventor： Don F. Haire ,  Cecil T. Ho ,  Guenther O. Langner ,  Werner Stickel ,  Edward V. Weber

IPC: G09G1/00 ,  G09G1/04 ,  H01J29/70 ,  H01J37/147 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H04N3/16

CPC classification number: H01J37/304 ,  H01J2237/04928 ,  H01J2237/1507 ,  H01J2237/153 ,  H01J2237/30461 ,  H01J2237/3175

Abstract: A dynamic correction arrangement for an electron beam projection/deflection system provides high order correction values for deflection in accordance with a correction equation. Particularly as applied to high accuracy telecentric deflection, the coefficients of terms of the correction equation may be determined by calibration for a small number of test points. Correction values may be stored in a look-up table or computed in real time by using a math co-processor in a processing pipeline. The correction provided corrects landing angle errors through the third order in telecentric projection/deflection systems such as systems utilizing variable axis immersion lenses.

Abstract translation: 电子束投影/偏转系统的动态校正装置根据校正方程为偏转提供高阶校正值。 特别是应用于高精度远心偏转时，校正方程的项的系数可以通过少量测试点的校准来确定。 校正值可以存储在查找表中或通过在处理流水线中使用数学协处理器实时计算。 该校正提供了在诸如利用可变轴浸没透镜的系统的远心投影/偏转系统中通过第三级校正着陆角误差。

公开(公告)号：US11670482B2

公开(公告)日：2023-06-06

申请号：US17037935

申请日：2020-09-30

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Rutger Meyer Timmerman Thijssen

IPC: H01J37/305 ,  H01J37/12 ,  G02B6/136 ,  H01J37/147 ,  H01J37/20 ,  G02B6/12

CPC classification number: H01J37/3053 ,  G02B6/136 ,  H01J37/12 ,  H01J37/1478 ,  H01J37/20 ,  H01J37/3056 ,  G02B2006/12107 ,  H01J2237/1507 ,  H01J2237/3174

Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.