公开(公告)号：US20060269116A1

公开(公告)日：2006-11-30

申请号：US11140559

申请日：2005-05-31

申请人： Andrej Makarovic ,  Willem Venema ,  Lambertus Kessels ,  Marcel Bontekoe

发明人： Andrej Makarovic ,  Willem Venema ,  Lambertus Kessels ,  Marcel Bontekoe

IPC分类号： G06K9/00

CPC分类号： G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

摘要： A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

公开(公告)号：US07477772B2

公开(公告)日：2009-01-13

申请号：US11140559

申请日：2005-05-31

申请人： Andrej Makarovic ,  Willem Jurrianus Venema ,  Lambertus Gerardus Maria Kessels ,  Marcel Bontekoe

发明人： Andrej Makarovic ,  Willem Jurrianus Venema ,  Lambertus Gerardus Maria Kessels ,  Marcel Bontekoe

IPC分类号： G06K9/00 ,  G06K9/54

CPC分类号： G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

摘要： A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

摘要翻译： 光刻设备包括独立可控元件阵列和数据处理流水线。 独立可控元件的阵列调制辐射束。 数据处理流水线将所请求的剂量模式的第一表示转换成适合于控制独立可控元件的阵列的控制数据序列，以便基本上在衬底上形成所请求的剂量图案。 数据处理流水线包括离线预处理设备和在线光栅器。 离线预处理设备将所请求的剂量模式的第一表示转换为中间表示，其可以以比第一表示少的操作进行光栅化。 存储设备存储中间表示。 在线光栅化器访问存储的中间表示，并由此产生用于基本上实时生成控制数据序列的位图数据流。

公开(公告)号：US20060139980A1

公开(公告)日：2006-06-29

申请号：US11020643

申请日：2004-12-27

申请人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

发明人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

IPC分类号： G11C19/08

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。

公开(公告)号：US07317510B2

公开(公告)日：2008-01-08

申请号：US11020643

申请日：2004-12-27

申请人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

发明人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。