公开(公告)号：US20060215142A1

公开(公告)日：2006-09-28

申请号：US11089539

申请日：2005-03-25

申请人： Pieter Willem De Jager ,  Theodorus Van Den Akker ,  Willem Venema ,  Wouter Mulckhuyse ,  Lambertus Gerardus Kessels

发明人： Pieter Willem De Jager ,  Theodorus Van Den Akker ,  Willem Venema ,  Wouter Mulckhuyse ,  Lambertus Gerardus Kessels

IPC分类号： G03B27/72

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.

摘要翻译： 其中通过调节图案特征边界处的辐射强度来调节形成在基底上的特征的尺寸和/或位置的光刻设备。

公开(公告)号：US20060139980A1

公开(公告)日：2006-06-29

申请号：US11020643

申请日：2004-12-27

申请人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

发明人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

IPC分类号： G11C19/08

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。