公开(公告)号：US20110127235A1

公开(公告)日：2011-06-02

申请号：US13022740

申请日：2011-02-08

Applicant: Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

Inventor： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC: B32B38/06

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

Abstract translation: 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p2 = p / 2。

公开(公告)号：US20180169876A1

公开(公告)日：2018-06-21

申请号：US15877342

申请日：2018-01-22

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: B26B1/10 ,  B26B1/02 ,  B26B1/04

CPC classification number: B26B1/10 ,  B26B1/00 ,  B26B1/02 ,  B26B1/04

Abstract: A folding knife that uses a four bar linkage mechanism to open and close. The knife can include a means of one hand opening and closing as well as a means to become latched in, and released from, a fixed position. The four bar linkage knife includes a blade, a handle, and the motion of a four bar linkage to open and close the knife. The four bar knife provides inherent safety because the four bar linkage motion can not fold onto the users hand.

公开(公告)号：US20170210018A1

公开(公告)日：2017-07-27

申请号：US15006253

申请日：2016-01-26

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: B26B1/10 ,  B26B1/02

CPC classification number: B26B1/10 ,  B26B1/00 ,  B26B1/02 ,  B26B1/04

Abstract: A folding knife that uses a four bar linkage mechanism to open and close. The knife can include a means of one hand opening and closing as well as a means to become latched in, and released from, a fixed position. The four bar linkage knife includes a blade, a handle, and the motion of a four bar linkage to open and close the knife. The four bar knife provides inherent safety because the four bar linkage motion can not fold onto the users hand.

公开(公告)号：US07906275B2

公开(公告)日：2011-03-15

申请号：US11849126

申请日：2007-08-31

Applicant: Steven R. J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

Inventor： Steven R. J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC: G03F7/26

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

Abstract translation: 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p2 = p / 2。

公开(公告)号：US20080057445A1

公开(公告)日：2008-03-06

申请号：US11849126

申请日：2007-08-31

Applicant: Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

Inventor： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC: G03C5/00

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

Abstract translation: 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p 2/2 = p / 2。

公开(公告)号：US08426121B2

公开(公告)日：2013-04-23

申请号：US13022740

申请日：2011-02-08

Applicant: Steven R. J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

Inventor： Steven R. J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC: G03F7/26

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

Abstract translation: 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p2 = p / 2。

公开(公告)号：US20070274633A1

公开(公告)日：2007-11-29

申请号：US11739472

申请日：2007-04-24

Applicant: Alex RAUB ,  Andrew Frauenglass ,  Steven R. J. Brueck

Inventor： Alex RAUB ,  Andrew Frauenglass ,  Steven R. J. Brueck

IPC: G02B6/34

CPC classification number: G02B6/1225 ,  B82Y20/00 ,  G02B6/02133 ,  G02B6/4204 ,  G02B2006/12107 ,  G03F7/70408

Abstract: Exemplary embodiments provide methods for patterning large areas, beyond those accessible with the limited single-area exposure techniques, with nanometer scale features. The methods can include forming a grating pattern to make a first interferometric exposure of a first portion of a photosensitive material disposed over a substrate by interfering two or more laser beams, wherein the two or more laser beams comprise an apodized intensity profile having a continuous intensity variation. The method can further include aligning and overlapping the grating pattern to expose a second portion of the photosensitive material such that the first portion and the second portion form a continuous grating pattern.

Abstract translation: 示例性实施例提供了利用纳米尺度特征对大面积图案进行图案化的方法，超出可用有限单面曝光技术访问的区域。 所述方法可以包括形成光栅图案，以通过干涉两个或更多个激光束对布置在基板上的感光材料的第一部分进行第一干涉曝光，其中两个或更多个激光束包括具有连续强度的变迹强度分布 变异。 该方法还可以包括对准和重叠光栅图案以暴露感光材料的第二部分，使得第一部分和第二部分形成连续的光栅图案。

公开(公告)号：US20050272179A1

公开(公告)日：2005-12-08

申请号：US11136306

申请日：2005-05-24

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: B81C1/00 ,  H01L21/42

CPC classification number: H01L21/42 ,  B81B2201/035 ,  B81B2201/058 ,  B81C1/00492 ,  B81C99/0095 ,  B81C2201/0159

Abstract: Embodiments of a structure and embodiments of methods for fabricating structures provide three dimensional features defined by exposure to multiple wavelengths of light. In an embodiment, material is exposed to two different wavelengths of light. Embodiments of three dimensional structures may provide a variety of three-dimensional structural features and characteristics.

Abstract translation: 用于制造结构的方法的结构和实施例的实施例提供通过暴露于多个波长的光而限定的三维特征。 在一个实施例中，材料暴露于两种不同波长的光。 三维结构的实施例可以提供各种三维结构特征和特征。

公开(公告)号：US11644665B2

公开(公告)日：2023-05-09

申请号：US17034956

申请日：2020-09-28

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: G02B26/00 ,  G02B26/10 ,  G02B26/12 ,  G02B27/12

CPC classification number: G02B26/101 ,  G02B26/12 ,  G02B27/123

Abstract: This disclosure of a scanner and method is a new way of removing non-uniformities from optical interference patterns.

公开(公告)号：US20220099962A1

公开(公告)日：2022-03-31

申请号：US17034956

申请日：2020-09-28

Applicant: Andrew Frauenglass

Inventor： Andrew Frauenglass

IPC: G02B26/10 ,  G02B27/12 ,  G02B26/12

Abstract: This disclosure of a scanner and method is a new way of removing non-uniformities from optical interference patterns.