公开(公告)号：US20170326733A1

公开(公告)日：2017-11-16

申请号：US15591694

申请日：2017-05-10

Applicant: Applied Materials, Inc.

Inventor： Narayanan RAMACHANDRAN ,  Karthik Narayanan BALAKRISHNAN ,  Rajkumar THANU ,  Jeffrey HUDGENS

IPC: B25J9/16 ,  B25J13/08 ,  B25J19/02

Abstract: Embodiments described herein generally relate to an apparatus and method of performing a robot calibration process within a substrate processing system. In one embodiment, a calibration device is used to calibrate a robot having an end effector. The calibration device includes a body, a first side and a second side opposite to the first side. The calibration device further includes a sensor disposed on the second side of the body. In some embodiments, the sensor covers the entire second side of the body. In this configuration, because the sensor covers the entire second side of the body of the calibration device, the calibration device can be utilized to sense the contact between the sensor and various differently configured chamber components found in different types of processing chambers or stations disposed within a processing system during a calibration process performed in each of the different processing chambers or stations.

公开(公告)号：US20240170311A1

公开(公告)日：2024-05-23

申请号：US17989980

申请日：2022-11-18

Applicant: Applied Materials, Inc.

Inventor： Ralph P. ANTONIO ,  Lee Guan TAY ,  Peter LAI ,  Sudhir R. GONDHALEKAR ,  Tzu-Fang HUANG ,  Jeffrey HUDGENS

IPC: H01L21/67 ,  B25J9/16 ,  B25J11/00 ,  B25J13/08 ,  B25J19/02 ,  G01S17/89 ,  H01L21/677

CPC classification number: H01L21/67259 ,  B25J9/161 ,  B25J11/0095 ,  B25J13/088 ,  B25J19/021 ,  G01S17/89 ,  H01L21/67742

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a transfer robot configured to position a substrate on a substrate support disposed within an interior of a processing chamber configured to process the substrate and a sensor disposed on the transfer robot, operably connected to a controller of the processing chamber, and configured with an angle of view to provide in-situ continuous closed loop feedback relating to spatial information of the interior of the processing chamber to the controller.