公开(公告)号：US20240170311A1

公开(公告)日：2024-05-23

申请号：US17989980

申请日：2022-11-18

Applicant: Applied Materials, Inc.

Inventor： Ralph P. ANTONIO ,  Lee Guan TAY ,  Peter LAI ,  Sudhir R. GONDHALEKAR ,  Tzu-Fang HUANG ,  Jeffrey HUDGENS

IPC: H01L21/67 ,  B25J9/16 ,  B25J11/00 ,  B25J13/08 ,  B25J19/02 ,  G01S17/89 ,  H01L21/677

CPC classification number: H01L21/67259 ,  B25J9/161 ,  B25J11/0095 ,  B25J13/088 ,  B25J19/021 ,  G01S17/89 ,  H01L21/67742

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a transfer robot configured to position a substrate on a substrate support disposed within an interior of a processing chamber configured to process the substrate and a sensor disposed on the transfer robot, operably connected to a controller of the processing chamber, and configured with an angle of view to provide in-situ continuous closed loop feedback relating to spatial information of the interior of the processing chamber to the controller.

公开(公告)号：US20230378006A1

公开(公告)日：2023-11-23

申请号：US17751511

申请日：2022-05-23

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Eric HOLLAR ,  Sock Hoon LIM ,  Yu YANG ,  Ralph P. ANTONIO ,  Gu LIU

IPC: H01L21/66 ,  H01L21/02 ,  G01N21/95 ,  G01J3/44

CPC classification number: H01L22/34 ,  H01L22/12 ,  H01L21/02041 ,  G01N21/9501 ,  G01J3/44 ,  G06N20/00

Abstract: Methods and systems for monitoring wafer processing results continuously and in real-time. In some embodiments, a system may comprise at least one non-active chamber with at least one feedthrough access port which is configured to interact with a metrology apparatus. The feedthrough access port has a surface exposed to an inner volume of the non-active chamber and has a fluorine-based coating covering the surface. The non-active chamber has a wafer access port to one or more other chambers. The metrology apparatus is positioned external to the non-active chamber and is oriented to detect metrology data through one of the feedthrough access ports. A data collection apparatus is connected to the metrology apparatus and configured to continuously receive data from the metrology apparatus.