公开(公告)号：US10364492B2

公开(公告)日：2019-07-30

申请号：US14515958

申请日：2014-10-16

Applicant: Applied Materials, Inc.

Inventor： Jeffrey W. Anthis ,  David Thompson ,  Ravi Kanjolia ,  Shaun Garrett

IPC: C23C16/18 ,  C23C16/455 ,  C22C22/00 ,  C23C16/34

Abstract: Methods are provided for deposition of films comprising manganese on surfaces using metal coordination complexes comprising an amidoimino-based ligand. Certain methods comprise exposing a substrate surface to a manganese precursor, and exposing the substrate surface to a co-reagent.

公开(公告)号：US20150118100A1

公开(公告)日：2015-04-30

申请号：US14515958

申请日：2014-10-16

Applicant: Applied Materials, Inc.

Inventor： Jeffrey W. Anthis ,  David Thompson ,  Ravi Kanjolia ,  Shaun Garrett

IPC: C23C16/18 ,  C01B21/06 ,  C22C22/00 ,  C23C16/455

CPC classification number: C23C16/18 ,  C22C22/00 ,  C23C16/34 ,  C23C16/45553

Abstract: Methods are provided for deposition of films comprising manganese on surfaces using metal coordination complexes comprising an amidoimino-based ligand. Certain methods comprise exposing a substrate surface to a manganese precursor, and exposing the substrate surface to a co-reagent.

Abstract translation: 提供了使用包含酰氨基亚胺基配体的金属配位络合物在表面上沉积包含锰的膜的方法。 某些方法包括将基底表面暴露于锰前体，并将基底表面暴露于共试剂。