公开(公告)号：US10571406B2

公开(公告)日：2020-02-25

申请号：US16179700

申请日：2018-11-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Katzir ,  Imry Kissos ,  Lavi Shachar ,  Amit Batikoff ,  Shaul Cohen ,  Noam Zac

IPC: G01N21/95

Abstract: One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.