公开(公告)号：US10296702B2

公开(公告)日：2019-05-21

申请号：US15698585

申请日：2017-09-07

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Katzir ,  Imry Kissos ,  Lavi Jacov Shachar ,  Amit Batikoff ,  Shaul Cohen ,  Noam Zac

IPC: G06F17/50 ,  G06T7/00 ,  G06T7/33 ,  G06T3/00 ,  G06T7/73

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.

公开(公告)号：US20190088444A1

公开(公告)日：2019-03-21

申请号：US16131289

申请日：2018-09-14

Applicant: Applied Materials Israel, Ltd.

Inventor： Shay Attal ,  Shaul Cohen ,  Guy Maoz ,  Noam Zac ,  Mor Baram ,  Lee Moldovan ,  Ishai Schwarzband ,  Ron Katzir ,  Kfir Ben-Zikri ,  Doron Girmonsky

IPC: H01J37/244 ,  G01B15/02 ,  H01J37/29

Abstract: A method for evaluating an object, the method may include acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the area includes multiple instances of a structure of interest, and the structure of interest is of a nanometric scale; determining multiple types of attributes from the image; reducing a number of the attributes to provide reduced attribute information; generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and evaluating an actual object by implementing the guidelines.

公开(公告)号：US11854184B2

公开(公告)日：2023-12-26

申请号：US17149614

申请日：2021-01-14

Applicant: Applied Materials Israel Ltd.

Inventor： Shalom Elkayam ,  Shaul Cohen ,  Noam Zac

IPC: G06T7/00 ,  G06T7/12 ,  G06T7/174 ,  G06T7/155 ,  G06T7/30

CPC classification number: G06T7/001 ,  G06T7/12 ,  G06T7/155 ,  G06T7/174 ,  G06T7/30 ,  G06T2207/10061 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: There are provided systems and methods of obtaining a segmented image of a semiconductor specimen, the image comprising first structural elements, obtaining a reference image of the semiconductor specimen, the reference image being based on design data and comprising second structural elements, determining, for at least one pair of elements including a first structural element and a corresponding second structural element, data Dspat informative of a spatial transformation required in order to match the elements of the pair in accordance with a matching criterion, and determining at least one of data informative of a defect in the first structural element and data informative of edge roughness of the first structural element using at least Dspat.

公开(公告)号：US10571406B2

公开(公告)日：2020-02-25

申请号：US16179700

申请日：2018-11-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Katzir ,  Imry Kissos ,  Lavi Shachar ,  Amit Batikoff ,  Shaul Cohen ,  Noam Zac

IPC: G01N21/95

Abstract: One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.

公开(公告)号：US10120973B2

公开(公告)日：2018-11-06

申请号：US15460078

申请日：2017-03-15

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Katzir ,  Imry Kissos ,  Lavi Jacov Shachar ,  Amit Batikoff ,  Shaul Cohen ,  Noam Zac

IPC: G06F11/22 ,  G06F17/50

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: accommodating definitions of metrology objects and metrology operations, at least one of the group consisting of the metrology objects and the metrology operations being defined using design data; accommodating a design-based representation and an image-based representation of the specimen, the design-based representation of the specimen comprising design-based representation of at least first metrology object, the image-based representation of the specimen comprising image-based representation of the at least first metrology object, the metrology operations including at least first metrology operation defined as related to the at least first metrology object and performed on at least the image-based representation of the specimen; mapping between the design-based representation and the image-based representation of the at least first metrology object; and performing the at least first metrology operation according to definition thereof using the mapping.