公开(公告)号：US20150191394A1

公开(公告)日：2015-07-09

申请号：US14661840

申请日：2015-03-18

Applicant: AvanStrate Inc. ,  HOYA CORPORATION

Inventor： Akihiro KOYAMA ,  Mikiko MORISHITA ,  Satoshi AMI ,  Kazuaki HASHIMOTO ,  Tetsuo TAKANO

IPC: C03C21/00 ,  C03C3/083 ,  C03C3/085 ,  C03C15/02 ,  C03C3/087

CPC classification number: C03C21/002 ,  C03C3/083 ,  C03C3/085 ,  C03C3/087 ,  C03C15/00 ,  C03C15/02

Abstract: The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.

Abstract translation: 所公开的盖玻璃通过蚀刻通过下拉法形成的玻璃基板，并化学强化玻璃基板，以在玻璃基板的主表面上提供压应力层来制造。 玻璃基板作为其成分含有50〜70质量％的SiO 2，5〜20质量％的Al 2 O 3，6〜30质量％的Na 2 O，0〜8质量％ Li2O。 如果需要，玻璃基板也可以含有0〜2.6质量％的CaO。 玻璃基板具有蚀刻特性，其中在温度为22℃的蚀刻环境中蚀刻速率至少为3.7μm/分钟，并且含有浓度为10质量％的氟化氢。