公开(公告)号：US20150191394A1

公开(公告)日：2015-07-09

申请号：US14661840

申请日：2015-03-18

Applicant: AvanStrate Inc. ,  HOYA CORPORATION

Inventor： Akihiro KOYAMA ,  Mikiko MORISHITA ,  Satoshi AMI ,  Kazuaki HASHIMOTO ,  Tetsuo TAKANO

IPC: C03C21/00 ,  C03C3/083 ,  C03C3/085 ,  C03C15/02 ,  C03C3/087

CPC classification number: C03C21/002 ,  C03C3/083 ,  C03C3/085 ,  C03C3/087 ,  C03C15/00 ,  C03C15/02

Abstract: The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.

Abstract translation: 所公开的盖玻璃通过蚀刻通过下拉法形成的玻璃基板，并化学强化玻璃基板，以在玻璃基板的主表面上提供压应力层来制造。 玻璃基板作为其成分含有50〜70质量％的SiO 2，5〜20质量％的Al 2 O 3，6〜30质量％的Na 2 O，0〜8质量％ Li2O。 如果需要，玻璃基板也可以含有0〜2.6质量％的CaO。 玻璃基板具有蚀刻特性，其中在温度为22℃的蚀刻环境中蚀刻速率至少为3.7μm/分钟，并且含有浓度为10质量％的氟化氢。

公开(公告)号：US20140309098A1

公开(公告)日：2014-10-16

申请号：US14314922

申请日：2014-06-25

Applicant: AvanStrate Inc.

Inventor： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC: C03C3/091

CPC classification number: C03C3/091 ,  C03B17/00 ,  C03B17/06 ,  C03B17/064 ,  C03B25/00 ,  C03C3/064 ,  C03C3/066 ,  C03C3/093 ,  G02F2001/133302

Abstract: A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.

Abstract translation: 平板显示器玻璃基板包括以摩尔％计含有55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3和3-25％RO（MgO，CaO，SrO， 和BaO）。 SiO 2，Al 2 O 3和B 2 O的摩尔％含量满足关系式（SiO2 + Al2O3）/（B2O3）= 7.5-17。 玻璃的应变点为665℃以上。 玻璃的失透温度为1250℃以下。 基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的基板的收缩量算出，该热处理以10℃/分钟和550℃的上升和下降温度进行2小时，以 热收缩率（ppm）= {热处理后的基板的收缩量/热处理前的基板的长度}×106。

公开(公告)号：US20140249018A1

公开(公告)日：2014-09-04

申请号：US14276843

申请日：2014-05-13

Applicant: AvanStrate Inc.

Inventor： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC: C03C3/091 ,  C03C3/093

CPC classification number: C03C3/091 ,  C03C3/093 ,  G02F2001/133302 ,  H01L51/0096

Abstract: A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3, and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.

Abstract translation: 根据本发明的平板显示器玻璃基板包括玻璃，其以摩尔％表示，为55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3，3-25％RO（总量 MgO，CaO，SrO和BaO），并且基本上不含As2O3和Sb2O3。 玻璃的失透温度为1250℃或更低。 玻璃基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的玻璃基板的收缩量，以10℃/分钟和550℃的升温和降温率通过热收缩率进行2小时计算 速率（ppm）= {热处理后的玻璃基板的收缩量/热处理前的玻璃基板的长度}×106。

公开(公告)号：US20150218040A1

公开(公告)日：2015-08-06

申请号：US14685953

申请日：2015-04-14

Applicant: AvanStrate Inc.

Inventor： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC: C03C3/091

CPC classification number: C03C3/091 ,  C03B25/00

Abstract: A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.

Abstract translation: 一种由具有高低温粘度特性温度的玻璃制成的p-Si TFT平板显示器基板，并且在通过直接电加热熔化期间避免熔化槽的侵蚀/磨损而制造。 所述玻璃基板包含52-78质量％的SiO 2，3-25质量％的Al 2 O 3，3-15质量％的B 2 O 3，3-20质量％的RO，其中RO是MgO，CaO，SrO和BaO的总量 ，0.01-0.8质量％的R 2 O，其中，R 2 O为Li 2 O，Na 2 O，K 2 O的总量，Sb 2 O 3为0〜0.3质量％，基本上不包含As 2 O 3，CaO / （SiO2 + Al2O3）/ B2O3的质量比（SiO 2 + Al 2 O 3）/ B 2 O 3在7〜30的范围内，质量比（SiO 2 + Al 2 O 3）/ RO等于或大于5.相关方法包括将玻璃原料混合 提供玻璃组成; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。

公开(公告)号：US20140249019A1

公开(公告)日：2014-09-04

申请号：US14277822

申请日：2014-05-15

Applicant: AvanStrate Inc.

Inventor： Akihiro KOYAMA ,  Satoshi AMI ,  Manabu ICHIKAWA

IPC: C03C3/093 ,  C03C3/091

CPC classification number: C03C3/091 ,  C03C3/093 ,  G02F2001/133302 ,  G02F2202/104

Abstract: A glass substrate for p-Si TFT flat panel displays that is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. A method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.

Abstract translation: 一种用于p-Si TFT平板显示器的玻璃基板，由玻璃构成，包括SiO 2为52-78质量％，Al 2 O 3为3〜25质量％，B 2为3〜15质量％，RO为3〜25质量％ 其中RO为MgO，CaO，SrO和BaO的总量，Fe2O3为0.01-1质量％，Sb2O3为0-0.3质量％，并且实质上不包含As2O3，玻璃的质量比（SiO 2 + Al 2 O 3）/ B2O3的范围为7〜30，质量比（SiO 2 + Al 2 O 3）/ RO为6以上。玻璃基板的制造方法包括：熔融步骤，通过熔融获得熔融玻璃，至少使用 直接电加热，玻璃原料混合以提供上述玻璃组合物; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。