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1.发明申请THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING 有权具有至少三个短链全氟化合物组合的表面活性剂在照相胶片清洁剂中的应用公开(公告)号：US20160161846A1
公开(公告)日：2016-06-09
申请号：US14904018
申请日：2014-07-08
Applicant: BASF SE
Inventor： Andreas Klipp , Andrei Honciuc , Chu-Ya Yang
CPC classification number: G03F1/82 , C11D1/004 , G03F1/22 , G03F1/24 , G03F1/68 , G03F7/20 , G03F7/32
Abstract: In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.
Abstract translation: 在具有小于200nm的线间距尺寸最小的图案的光掩模的方法中，使用表面活性剂组合物A，其中A包含至少三个短链全氟化基团，Rf选自三氟甲基，五氟乙基， 七氟丙基，2-七氟丙基和五氟硫烷基，其中A在1重量％的水溶液中表现出低于25mN / m的静态表面张力。
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公开(公告)号：US09891520B2
公开(公告)日：2018-02-13
申请号：US14904018
申请日：2014-07-08
Applicant: BASF SE
Inventor： Andreas Klipp , Andrei Honciuc , Chu-Ya Yang
CPC classification number: G03F1/82 , C11D1/004 , G03F1/22 , G03F1/24 , G03F1/68 , G03F7/20 , G03F7/32
Abstract: In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.
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