公开(公告)号：US20190233941A1

公开(公告)日：2019-08-01

申请号：US16318204

申请日：2017-07-17

Applicant: BASF SE

Inventor： Tillmann LIEBSCH ,  Frank KLEINE JAEGER ,  Daniel SILBERNAGEL ,  Stefan STREGE

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/52 ,  H01M4/525 ,  H01M4/505 ,  H01M4/36

CPC classification number: C23C16/45551 ,  C23C16/4401 ,  C23C16/4417 ,  C23C16/45548 ,  C23C16/45555 ,  C23C16/52 ,  C23C16/54 ,  H01M4/366 ,  H01M4/505 ,  H01M4/525 ,  H01M10/052

Abstract: The present invention relates to an apparatus for coating particles by atomic layer deposition comprising (a) a first reactor capable of bringing particles in contact with a first reactive gas and (b) a second reactor capable of bringing particles in contact with a second reactive gas, wherein the first and the second reactor are separated by a first and a second gas lock and the particles can be conveyed from the first reactor through the first gas lock to the second reactor and at the same time the particles can be conveyed from the second reactor through the second gas lock to the first reactor.