Abstract:
A continuous process for preparing (meth)acrylates of C10-alcohol mixtures by reaction of glacial (meth)acrylic acid with an isomer mixture of C10-alcohols composed of 2-propylheptanol as the main isomer and at least one of the C10-alcohols 2-propyl-4-methylhexanol, 2-propyl-5-methylhexanol, 2-isopropylheptanol, 2-isopropyl-4-methylhexanol, 2-isopropyl-5-methylhexanol and/or 2-propyl-4,4-dimethylpentanol, and the use of a diester of dicarboxylic acids which have been esterified with N-oxyl-containing compounds as polymerization inhibitors in such a process.
Abstract:
The invention is related to a process for production of acrylic acid comprising the following steps: a) preparation of a product gas mixture by a catalytic gas-phase oxidation of at least one C3 precursor compound to acrylic acid, wherein acrylic acid is formed as a main product of the catalytic gas-phase oxidation and glyoxal is formed as a by-product and the product gas mixture comprises acrylic acid and glyoxal, b) cooling of the product gas mixture, c) contacting the product gas mixture in countercourrent with an absorbent, wherein an absorbate A, comprising the absorbent and absorbed acrylic acid, is formed, d) introducing a feed stream F (2) comprising at least part of the absorbate A into a rectification column comprising a rectifying section and a stripping section, e) enriching the absorbent in the stripping section and enriching acrylic acid in the rectifying section, f) withdrawing a stream C of crude acrylic acid comprising at least 90% by weight of acrylic acid out of the rectifying section as a side stream, wherein step c) is carried out in an absorption column (12) comprising at least two cooling loops, a first cooling loop (14), wherein a high boiler fraction of the product gas mixture is condensed and a second cooling loop (16), wherein a low boiler fraction of the product gas mixture is condensed, wherein a portion of the absorbate A, which comprises the feed stream F (2), is removed from the absorption column (12) at a side take-off (20), the side take-off (20) being located at the first cooling loop (14) or at a height of the absorption column (12) between the first cooling loop (14) and the second cooling loop (16) and wherein a temperature Tc of the absorbate A in the second cooling loop is at least 56° C.