公开(公告)号：US10267425B2

公开(公告)日：2019-04-23

申请号：US15142591

申请日：2016-04-29

Applicant: CKD CORPORATION

Inventor： Masaki Yoshida ,  Michio Miyashita ,  Shoji Azuma ,  Takayuki Kumagai

IPC: F16K7/17 ,  B29C45/14 ,  F16K25/00 ,  B29K627/18 ,  B29K71/00 ,  B29K105/20 ,  B29K671/00 ,  B29L31/00

Abstract: A diaphragm having chemical resistance is disclosed. The diaphragm includes a membrane portion and a connection portion which enables connection of the membrane portion to another member. The membrane portion is formed of a first material having chemical resistance. The connection portion is formed of a second material whose main material is the same as that of the first material. The membrane portion and the connection portion are directly bonded together.

公开(公告)号：US20240287977A1

公开(公告)日：2024-08-29

申请号：US18658346

申请日：2024-05-08

Applicant: CKD CORPORATION

Inventor： Masaki Yoshida ,  Yoshifumi Nishio ,  Takayuki Kumagai ,  Shigenobu Nishida

IPC: F04B43/02 ,  H01L21/67

CPC classification number: F04B43/02 ,  H01L21/67017

Abstract: A diaphragm to be used in a chemical flow control device that controls a flow of a chemical in a semiconductor manufacturing process and to which a pressure of a working gas is applied. The diaphragm includes a membrane portion and a permeation reduction layer. The membrane portion is made of fluoroplastic that is resistant to the chemical. The permeation reduction layer is less likely to pass the working gas in comparison to the membrane portion and disposed on a surface of the membrane portion to which the pressure of the working gas is applied.