公开(公告)号：US20240287977A1

公开(公告)日：2024-08-29

申请号：US18658346

申请日：2024-05-08

Applicant: CKD CORPORATION

Inventor： Masaki Yoshida ,  Yoshifumi Nishio ,  Takayuki Kumagai ,  Shigenobu Nishida

IPC: F04B43/02 ,  H01L21/67

CPC classification number: F04B43/02 ,  H01L21/67017

Abstract: A diaphragm to be used in a chemical flow control device that controls a flow of a chemical in a semiconductor manufacturing process and to which a pressure of a working gas is applied. The diaphragm includes a membrane portion and a permeation reduction layer. The membrane portion is made of fluoroplastic that is resistant to the chemical. The permeation reduction layer is less likely to pass the working gas in comparison to the membrane portion and disposed on a surface of the membrane portion to which the pressure of the working gas is applied.