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    Imaging optical unit for EUV projection lithography
    1.
    发明授权
    Imaging optical unit for EUV projection lithography 有权

    公开(公告)号：US10191386B2

    公开(公告)日：2019-01-29

    申请号：US15810735

    申请日：2017-11-13

    申请人： Carl Zeiss SMT GmbH

    发明人： Johannes Ruoff ,  Josef Rapp

    IPC分类号： G03F7/20 ,  G02B13/22 ,  G02B17/06 ,  G02B5/00 ,  G02B5/08 ,  G02B26/02 ,  G21K1/02 ,  G21K1/06

    摘要： An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

    IMAGING OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
    3.
    发明申请
    IMAGING OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY 有权
    用于EUV投影光刻的成像光学单元

    公开(公告)号：US20160147158A1

    公开(公告)日：2016-05-26

    申请号：US14945837

    申请日：2015-11-19

    申请人： Carl Zeiss SMT GmbH

    发明人： Johannes Ruoff ,  Josef Rapp

    IPC分类号： G03F7/20 ,  G02B26/02 ,  G02B17/06 ,  G21K1/06 ,  G02B5/08 ,  G02B5/00 ,  G21K1/02

    CPC分类号： G03F7/702 ,  G02B5/005 ,  G02B5/0891 ,  G02B13/22 ,  G02B17/0652 ,  G02B17/0663 ,  G02B26/02 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/7025 ,  G21K1/02 ,  G21K1/067

    摘要： An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1° in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NAx measured in one plane from a numerical aperture NAy measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

    摘要翻译： 用于EUV投影光刻的成像光学单元用于将物场映像成图像场。 镜像引导成像光从物场到图像场。 孔径光阑相对于垂直于光轴的法向平面倾斜至少1°。 孔径光阑具有圆形止动轮廓。 在相互垂直的平面中，在一个平面中测量的数值孔径NAx与在另一平面中测量的数值孔径NAy的偏差小于0.003，在图像场的场点上平均。 出现的是成像光学单元，其中确保了图像侧数值孔径的均匀化，使得在平面中不变的高结构分辨率成为可能，独立于成像光的入射平面的取向 图像字段。