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1.
公开(公告)号:US12106867B2
公开(公告)日:2024-10-01
申请号:US15325958
申请日:2015-08-13
申请人: BRUKER NANO GMBH
发明人: Ulrich Waldschläger
IPC分类号: G01N23/00 , G01N23/20008 , G01N23/20016 , G21K1/06 , G21K7/00
CPC分类号: G21K1/067 , G01N23/20008 , G01N23/20016 , G01N2223/33 , G21K7/00 , G21K2201/067
摘要: A method for scanning a sample by means of X-ray optics for irradiating the sample with X-rays, comprises the following steps:
(a) displacing a measuring point, defined by an optical exit point of the X-ray optics, in the sample in a first scanning direction by means of swiveling the X-ray optics about a first swivel axis;
(b) detecting radiation emanating from the sample at, at least, two measuring points along the first scanning direction;
(c) combining measured values correlating with the detected radiation to form an overall scan.-
公开(公告)号:US11923102B2
公开(公告)日:2024-03-05
申请号:US17540479
申请日:2021-12-02
申请人: Asa Asadollahbaik
摘要: The present disclosure relates to a rotationally symmetric dielectric structure for optical beam shaping and for trapping and manipulating individual particles and living biological cells in aqueous medium, concentrically mounted on the facet of a single-mode optical fiber, wherein the structure comprises at least three total reflection surfaces configured to split a light field emerging from the single-mode optical fiber into at least two separate light paths and wherein the at least three total reflection surfaces are further configured to bring the separate light paths together as a ring beam in a common focal point.
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公开(公告)号:US20240047092A1
公开(公告)日:2024-02-08
申请号:US17642015
申请日:2019-09-11
发明人: Wolfgang Braun , Robin Wanke
摘要: The present invention relates to an aperture (10) for electromagnetic radiation (100), preferably electromagnetic radiation (100) comprising a wavelength between 1 nm and 20 μm, comprising an aperture body (20) made of a body material (22) transparent for the electromagnetic radiation (100). Further, the present invention relates to a method for aligning an aperture (10), and additionally to a system (70) for applying electromagnetic radiation (100) onto a source material and a dispersing element (90) for such a system (70).
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4.
公开(公告)号:US11879170B2
公开(公告)日:2024-01-23
申请号:US16993733
申请日:2020-08-14
发明人: Youwei Yao , Brandon Chalifoux , Mark Schattenburg
CPC分类号: C23C16/4407 , C23C18/1607 , G21K1/067 , H01L21/02123 , G21K2201/064 , G21K2201/067 , H01L21/02002
摘要: A device includes a substrate and a stressed layer disposed on a first surface of the substrate. The stressed layer includes: a first set of patterns having a predetermined geometry, size, and arrangement selected to control an equibiaxial stress field of the stressed layer, wherein the equibiaxial stress field varies in magnitude over the first surface of the substrate, and a second set of patterns etched into the first set of patterns and the substrate, the second set of patterns comprising a plurality of substantially parallel lines arranged to control at least a uniaxial stress field of the stressed layer, wherein the uniaxial stress field varies in magnitude over the first surface of the substrate.
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公开(公告)号:US20230386695A1
公开(公告)日:2023-11-30
申请号:US18449142
申请日:2023-08-14
摘要: An optical trap for laser cooling and trapping atoms. Three pairs of laser beams are directed to cross in a vacuum chamber at a common intersection volume, wherein each pair is formed by two counterpropagating beams. Rather than having a mutually orthogonal arrangement in which each beam pair forms an angle χ of 45° to a reference axis, z, these angles are instead between 5°≤χ≤40°. Moreover, in each beam pair, the counterpropagating beams are not precisely aligned in a common path, as in a conventional magneto-optical trap, but are slightly misaligned by respective misalignment angles [α, β, κ] of typically 0.1° to 2°. The misalignment angles and beam widths are however selected so that a common intersection volume for all six beams is maintained. This provides an all-optical trap in which laser cooling and trapping of atoms takes place without a magnetic field being present.
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公开(公告)号:US20180261352A1
公开(公告)日:2018-09-13
申请号:US15759922
申请日:2016-09-23
申请人: OSAKA UNIVERSITY
发明人: Satoshi MATSUYAMA , Jumpei YAMADA
CPC分类号: G21K7/00 , G21K1/06 , G21K1/065 , G21K1/067 , G21K2201/064
摘要: To provide an X-ray microscope that has a size small enough to be brought into a room by shortening the path length, an X-ray microscope including at least one of each of an X-ray source 1, a sample holding part 3, a concave KB mirror 4, a convex KB mirror 5, and a light receiving part 8 located at a position in an imaging relation to a position of the sample holding part 3 in this order along an optical axis is fabricated.
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7.
公开(公告)号:US20180073995A1
公开(公告)日:2018-03-15
申请号:US15696840
申请日:2017-09-06
IPC分类号: G01N23/04 , G01N23/083
CPC分类号: G01N23/04 , G01N23/041 , G01N23/083 , G21K1/067
摘要: A method and an X-ray apparatus generate a projective X-ray representation of an examination object. Two projective images obtained from a phase contrast measurement are adapted to each other in respect of their representation format and a result image is generated by combining the adapted images. The result image allows extensive separation of different structures in the examination object that is used.
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公开(公告)号:US20170343486A1
公开(公告)日:2017-11-30
申请号:US15538622
申请日:2015-11-20
申请人: Shimadzu Corporation
发明人: Koichi TANABE , Shingo FURUI , Hiroyuki KISHIHARA , Kenji KIMURA , Taro SHIRAI , Takahiro DOKI , Satoshi SANO , Akira HORIBA
CPC分类号: G01N23/04 , A61B6/4291 , A61B6/4429 , A61B6/4476 , A61B6/484 , A61B6/487 , A61B6/5235 , G01N2223/1016 , G01N2223/501 , G21K1/067 , G21K1/10 , G21K2207/005
摘要: Provided is a radiation phase-contrast imaging device capable of assuredly detecting a self-image and precisely imaging the internal structure of an object. According to the configuration of the present invention, the longitudinal direction of a detection surface of a flat panel detector is inclined with respect to the extending direction of an absorber in a phase grating. This causes variations in the position (phase) of a projected stripe pattern of a self-image at different positions on the detection surface. This is therefore expected to produce the same effects as those obtainable when a plurality of self-images are obtained by performing imaging a plurality of times in such a manner that the position of the projected self-images on the detection surface varies. This alone, however, results in a single self-image phase for a specific region of the object. Therefore, according to the present invention, it is configured such that imaging is performed while changing the relative position of the imaging system and the object.
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9.
公开(公告)号:US09685251B2
公开(公告)日:2017-06-20
申请号:US14439241
申请日:2013-10-28
发明人: Sergey Gorelick
CPC分类号: G21K1/067 , A61B6/4291 , A61B6/484 , G01V5/0016 , G02B5/1838 , G21K1/043 , G21K1/06 , G21K2201/067 , G21K2207/005
摘要: The present invention relates to a method for producing an image of a target using radiation and a diffraction grating and apparatus for x-ray imaging. The method comprises directing a beam of radiation to the target to produce a modified beam through interaction with the target, directing the modified beam to an diffraction grating to produce an interference pattern, detecting the interference pattern using a detector, and forming an image of the target using the interference pattern measured. According to the invention, the diffraction grating is modified n the plane of the grating during the imaging so that at least two interference patterns are detected using the detector different configurations of the diffraction grating. Further, the image of the target using the at least two interference patterns measured. The invention provides a simple configuration, less radiation exposure and/or better image quality then conventional imaging methods.
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公开(公告)号:US09599788B2
公开(公告)日:2017-03-21
申请号:US14809431
申请日:2015-07-27
申请人: Carl Zeiss SMT GmbH
发明人: Jan Horn , Benedikt Knauf
CPC分类号: G02B7/1827 , G02B5/0891 , G02B5/09 , G02B7/1822 , G02B19/0095 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70141 , G03F7/702 , G03F7/70825 , G21K1/067
摘要: The present invention relates to an optical module, in particular facet mirror, comprising an optical element and a supporting structure for supporting the optical element, wherein the supporting structure comprises a positioning device for actively setting a position and/or orientation of the optical element in at least one degree of freedom. The supporting structure comprises a selectively activatable contacting device having at least one contacting unit having a first contact section, wherein the first contact section, in an activated state of the contacting device, contacts a second contact section of the optical element in order to exert a contact force on the optical element, while the first contact section, in a deactivated state of the contacting device is removed from the second contact section.
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