公开(公告)号：US20190022921A1

公开(公告)日：2019-01-24

申请号：US16145266

申请日：2018-09-28

Applicant: ESSILOR INTERNATIONAL

Inventor： Sebastien MAURICE ,  Frederic DUBOIS

IPC: B29C59/16 ,  B29D11/00 ,  B23K26/06 ,  B23K26/00 ,  B23K26/0622 ,  B23K26/352 ,  B23K26/361 ,  B23K103/00

Abstract: A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and about 5 ns, and has an energy per pulse ranging between about 5 μJ and about 100 μJ. A laser marking process configured to produce permanent engravings on an ophthalmic lens (3) via this device is also described.

公开(公告)号：US20160207249A1

公开(公告)日：2016-07-21

申请号：US14917113

申请日：2014-09-19

Applicant: ESSILOR INTERNATIONAL (Compagnie Générale d'Optique)

Inventor： Sebastien MAURICE ,  Frederic DUBOIS

IPC: B29C59/16 ,  B29D11/00

CPC classification number: B29C59/16 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/355 ,  B23K26/361 ,  B23K2103/30 ,  B23K2103/50 ,  B29D11/00932

Abstract: A device for marking an ophthalmic lens (3), the lens (3) being made of at least one preset material, includes a laser (1) configured to produce permanent engravings on the lens (3) and configured to emit a focused beam of pulsed ultraviolet laser radiation that includes at least one radiation wavelength ranging between 200 nm and 300 nm, has a pulse length ranging between about 0.1 ns and about 5 ns, and has an energy per pulse ranging between about 5 μJ and about 100 μJ. A laser marking process configured to produce permanent engravings on an ophthalmic lens (3) via this device is also described.

Abstract translation: 一种用于标记眼用透镜（3）的装置，所述透镜（3）由至少一个预设材料制成，包括：激光器（1），被配置为在所述透镜（3）上产生永久性雕刻，并且被配置为发射聚焦光束 包括200nm至300nm范围内的至少一个辐射波长的脉冲紫外激光辐射具有在约0.1ns至约5ns之间的脉冲长度，并且每脉冲的能量范围在约5μJ至约100μJ之间。 还描述了经配置以经由该装置在眼镜（3）上产生永久性雕刻的激光打标过程。

公开(公告)号：US20160167173A1

公开(公告)日：2016-06-16

申请号：US14898711

申请日：2014-06-25

Applicant: ESSILOR INTERNATIONAL (COMPAGNIE GÉNÉRALE D'OPTIQUE

Inventor： Frederic DUBOIS ,  Sebastien MAURICE

IPC: B23K26/362 ,  G02C7/02 ,  B23K26/402

Abstract: A method for producing an ophthalmic lens includes a step of laser marking in order to produce permanent etchings on one surface of the lens, at least one predefined step subsequent to the marking step and implementing extreme thermal stress that is applied to the surface, and a step of determining an operating point (PF) of a laser marking machine (1) configured to implement the marking step from geometric characteristics (Di) of the etchings to be made, the determining step including the steps of determining (304) a value (CPM) representative of the deformation of the lens on at least one treatment area of the surface, from the stress and data relative to a predetermined material from which the lens is formed, and of deducing (308) the operating point from the value representative of deformation and from the geometric characteristics.

Abstract translation: 一种用于制造眼镜片的方法包括激光标记步骤，以便在透镜的一个表面上产生永久蚀刻，在标记步骤之后的至少一个预定步骤和施加到表面的极端热应力，以及 确定激光打标机（1）的工作点（PF）的步骤，所述激光打标机（1）被配置为从要进行的蚀刻的几何特征（Di）执行所述标记步骤，所述确定步骤包括以下步骤：确定（304） CPM）代表从相对于形成透镜的预定材料的应力和数据的表面的至少一个处理区域上的透镜的变形，并且从表示该透镜的值的值中减去（308）工作点 变形和几何特征。