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公开(公告)号：US08638421B2
公开(公告)日：2014-01-28
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US20090091716A1
公开(公告)日：2009-04-09
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US09655222B2
公开(公告)日：2017-05-16
申请号：US13599494
申请日：2012-08-30
CPC分类号： H05G2/005 , G03F7/70033 , H05G2/006 , H05G2/008 , Y10T29/49815 , Y10T29/49817 , Y10T29/49826 , Y10T29/49865
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a reservoir configured to retain a volume of fuel; a nozzle, in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma; and a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of that contamination filter assembly being held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.
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