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公开(公告)号：US20100157260A1
公开(公告)日：2010-06-24
申请号：US12631113
申请日：2009-12-04
申请人： Thijs Egidius Johannes KNAAPEN , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes KNAAPEN , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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公开(公告)号：US08514365B2
公开(公告)日：2013-08-20
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或使排水管内的气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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公开(公告)号：US08638421B2
公开(公告)日：2014-01-28
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US20090091716A1
公开(公告)日：2009-04-09
申请号：US12233000
申请日：2008-09-26
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
摘要翻译： 描述了一种浸没式光刻设备，其中设置入口以向位于衬底台上的物体（例如衬底）和衬底台之间的空间提供清洁流体。
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公开(公告)号：US08780321B2
公开(公告)日：2014-07-15
申请号：US12631113
申请日：2009-12-04
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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7.发明授权Methods relating to immersion lithography and an immersion lithographic apparatus 有权涉及浸没式光刻和浸没式光刻设备的方法公开(公告)号：US08587762B2
公开(公告)日：2013-11-19
申请号：US12237557
申请日：2008-09-25
申请人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
发明人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
CPC分类号： G03F7/70916 , G03F7/70341
摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。
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公开(公告)号：US20110273679A1
公开(公告)日：2011-11-10
申请号：US13187086
申请日：2011-07-20
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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9.发明申请METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS 有权与倾斜光刻相关的方法和静态光刻设备公开(公告)号：US20090086175A1
公开(公告)日：2009-04-02
申请号：US12237557
申请日：2008-09-25
申请人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
发明人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
CPC分类号： G03F7/70916 , G03F7/70341
摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。
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