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公开(公告)号:US20210408265A1
公开(公告)日:2021-12-30
申请号:US17355977
申请日:2021-06-23
Inventor: Kun Sik PARK , Jong Il WON , Doo Hyung CHO , Hyun Gyu JANG , Dong Yun JUNG
IPC: H01L29/66 , H01L29/745 , H01L29/749
Abstract: The present invention forms an off-FET channel having a uniform and short length by using a self-align process of a method of forming and recessing a spacer, thereby enhancing the current driving capability of an off-FET and the uniformity of a device operation.
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公开(公告)号:US20220020671A1
公开(公告)日:2022-01-20
申请号:US17380583
申请日:2021-07-20
Inventor: Dong Yun JUNG , Hyun Gyu JANG , Sung Kyu KWON , Kun Sik PARK , Jong Il WON , Seong Hyun LEE , Jong Won LIM , Doo Hyung CHO
IPC: H01L23/495 , H01L23/00
Abstract: The present invention minimizes parasitic inductance at the time of packaging a semiconductor that requires high efficiency and high-speed switching driving. In implementing a semiconductor package composed of one or more switching devices and one or more diode devices, the present invention provides a flip-stack structure in which a switching device is mounted on an insulating substrate or a metal frame, a flat metal is bonded onto the switching device, and a diode device is flipped and stacked on the flat metal, and accordingly, the flat metal with a large area is used for connection between the devices and between the devices and the insulating substrate, thereby minimizing parasitic inductance generated at a time of semiconductor packaging and automating the entire process of the semiconductor packaging.
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