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公开(公告)号:US10961617B2
公开(公告)日:2021-03-30
申请号:US14870981
申请日:2015-09-30
Applicant: Entegris, Inc.
Inventor: I-Kuan Lin , Nilesh Gunda , Dennis Radgowski , Chandra Venkatraman
Abstract: Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium.
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公开(公告)号:US20160273095A1
公开(公告)日:2016-09-22
申请号:US14870981
申请日:2015-09-30
Applicant: Entegris, Inc.
Inventor: I-Kuan Lin , Nilesh Gunda , Dennis Radgowski , Chandra Venkatraman
CPC classification number: C23C14/48 , C23C14/08 , C23C14/083 , C23C14/58 , C23C14/5806 , C23C14/5846 , H01J37/32467 , H01J37/32495
Abstract: Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium.
Abstract translation: 提供了具有优异的等离子体耐蚀刻性并且可以延长RIE部件寿命的涂层的制品和方法。 一种制品具有真空兼容的衬底和覆盖至少一部分衬底的保护膜。 膜包含含有钇的氟化金属氧化物。
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