公开(公告)号：US20170170016A1

公开(公告)日：2017-06-15

申请号：US14967755

申请日：2015-12-14

Applicant: GLOBALFOUNDRIES INC.

Inventor： Woo-Hyeong Lee ,  Jujin An ,  Shahrukh A. Khan ,  Rosa A. Orozco-Teran ,  Oluwafemi O. Ogunsola ,  William K. Henson ,  Scott R. Stiffler

IPC: H01L21/033 ,  H01L21/8238 ,  H01L21/027

CPC classification number: H01L21/823871 ,  H01L21/0332 ,  H01L21/31144 ,  H01L21/743 ,  H01L21/76816 ,  H01L21/76898 ,  H01L23/485

Abstract: Methods for multiple patterning a substrate may include: forming a hard mask including a carbonaceous layer and an oxynitride layer over the carbonaceous layer on a substrate; and forming a first pattern into the oxynitride layer and partially into the carbonaceous layer using a first soft mask positioned over the hard mask. A wet etching removes a portion of the first soft mask from the first pattern in the oxynitride layer without damaging the carbonaceous layer. Subsequently, a second pattern and a third pattern are formed into the hard mask, creating a multiple pattern in the hard mask. The multiple pattern may be etched into the substrate, followed by removing any remaining portion of the hard mask.