Selection of replacement patterns for reducing manufacturing hotspots and constraint violations of IC designs
    1.
    发明授权
    Selection of replacement patterns for reducing manufacturing hotspots and constraint violations of IC designs 有权
    选择用于减少制造热点和限制违反IC设计的替代模式

    公开(公告)号:US08869077B1

    公开(公告)日:2014-10-21

    申请号:US13901164

    申请日:2013-05-23

    CPC classification number: G06F17/5081 G06F2217/12 Y02P90/265

    Abstract: Methodologies and an apparatus enabling an improvement of a manufacturing yield of an IC design are disclosed. Embodiments include: determining a portion of a layout of an IC design, the portion including a first pattern including a plurality of design connections; determining a function performed by the first pattern based, at least in part, on the design connections; and selecting, by a processor, a second pattern based on the function.

    Abstract translation: 公开了能够提高IC设计的制造成品率的方法和装置。 实施例包括:确定IC设计的布局的一部分,该部分包括包括多个设计连接的第一图案; 至少部分地基于所述设计连接来确定由所述第一图案执行的功能; 以及基于所述功能,由处理器选择第二模式。

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