-
公开(公告)号：US10863613B2
公开(公告)日：2020-12-08
申请号：US16560611
申请日：2019-09-04
Applicant: Gigaphoton Inc.
Inventor： Shinji Okazaki , Osamu Wakabayashi
Abstract: An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies “0.09 m≤Lez≤3 m;” and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.
-
公开(公告)号：US10512149B2
公开(公告)日：2019-12-17
申请号：US16214435
申请日：2018-12-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Shinji Okazaki
Abstract: An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.
-
3.发明授权公开(公告)号：US09507248B2
公开(公告)日：2016-11-29
申请号：US13681744
申请日：2012-11-20
Applicant: Gigaphoton Inc.
Inventor： Shinji Okazaki , Hakaru Mizoguchi , Junichi Fujimoto , Takashi Matsunaga , Kouji Kakizaki , Osamu Wakabayashi
CPC classification number: G03B27/522 , G03F7/70408
Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.
Abstract translation: 双光束干涉装置可以包括其上可以设置晶片的晶片台，分束器，用于将第一激光分离成具有沿晶片表面内的第一方向延伸的光束强度分布的第二和第三激光， 以及将第二和第三激光引导到晶片上的光学系统。 从垂直于第一方向的第二方向照射第二激光，从与第一方向垂直但与第二方向不同的第三方向照射第三激光，从而引起第二和第三激光的干涉 光在晶圆上。 该装置增加了双光束干涉曝光的精度。
-
-
Search Results
3
records
(took 0.012 seconds)
