公开(公告)号：US10136509B2

公开(公告)日：2018-11-20

申请号：US15616167

申请日：2017-06-07

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Yutaka Shiraishi ,  Shinya Ikesaka ,  Takanobu Ishihara ,  Toshiro Umeki

IPC: H05G2/00

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

公开(公告)号：US10237961B2

公开(公告)日：2019-03-19

申请号：US16155192

申请日：2018-10-09

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Yutaka Shiraishi ,  Shinya Ikesaka ,  Takanobu Ishihara ,  Toshiro Umeki

IPC: H05G2/00

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.