公开(公告)号：US10136509B2

公开(公告)日：2018-11-20

申请号：US15616167

申请日：2017-06-07

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Yutaka Shiraishi ,  Shinya Ikesaka ,  Takanobu Ishihara ,  Toshiro Umeki

IPC: H05G2/00

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

公开(公告)号：US09648715B2

公开(公告)日：2017-05-09

申请号：US15143066

申请日：2016-04-29

Applicant: Gigaphoton Inc.

Inventor： Yutaka Shiraishi ,  Toshiyuki Hirashita ,  Shinya Ikesaka

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include: a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated. The filter may include a first through-hole configured to allow the liquid target material to pass therethrough, and an inner surface of the first through-hole may be coated with a material which is not easy to react with the liquid target material.

公开(公告)号：US10237961B2

公开(公告)日：2019-03-19

申请号：US16155192

申请日：2018-10-09

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Yutaka Shiraishi ,  Shinya Ikesaka ,  Takanobu Ishihara ,  Toshiro Umeki

IPC: H05G2/00

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.