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公开(公告)号：US10524343B2
公开(公告)日：2019-12-31
申请号：US16429331
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Toshihiro Nishisaka , Yutaka Shiraishi
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
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公开(公告)号：US09233782B2
公开(公告)日：2016-01-12
申请号：US13715897
申请日：2012-12-14
Applicant: GIGAPHOTON INC
Inventor： Takanobu Ishihara , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
Abstract translation: 目标供给装置可以包括：具有第一材料的圆柱形的罐，用于覆盖罐的圆柱形部分，圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成，第一盖由第二材料形成， 具有通孔，所述第一盖设置在所述圆筒部的轴向的一端，所述第二盖由所述第二材料形成，并且设置在所述圆筒部的轴向的一端的相反侧的另一端，以及 喷嘴，其设置成与所述罐的内部流体连通并且穿过所述通孔，所述喷嘴由所述第一材料形成。
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公开(公告)号：US08705035B2
公开(公告)日：2014-04-22
申请号：US13744334
申请日：2013-01-17
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC: G01N21/00
CPC classification number: B05B17/06 , B05B5/001 , B05B5/035 , B05B12/082 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.
Abstract translation: 用于确定由脉冲电压驱动以产生目标材料的液滴的目标发生器的目标生成条件的装置可以包括检测器，被配置为检测由目标发生器产生的目标并输出目标的检测信号， 以及控制器，被配置为控制用于驱动目标发生器的脉冲电压的脉冲持续时间。 控制器可以基于检测信号来确定目标发生器是否产生目标，并且基于检测信号来确定生成的目标是否包括多个液滴。
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公开(公告)号：US10136509B2
公开(公告)日：2018-11-20
申请号：US15616167
申请日：2017-06-07
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Shinya Ikesaka , Takanobu Ishihara , Toshiro Umeki
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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公开(公告)号：US10237961B2
公开(公告)日：2019-03-19
申请号：US16155192
申请日：2018-10-09
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Shinya Ikesaka , Takanobu Ishihara , Toshiro Umeki
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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Patent Agency Ranking
6.发明授权公开(公告)号：US10028365B2
公开(公告)日：2018-07-17
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tsukasa Hori , Takashi Saito , Yutaka Shiraishi
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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公开(公告)号：US09338869B2
公开(公告)日：2016-05-10
申请号：US14875166
申请日：2015-10-05
Applicant: Gigaphoton, Inc. , CKD Corporation
Inventor： Takanobu Ishihara , Hiroshi Itafuji
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
Abstract: A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.
Abstract translation: 目标供给装置包括用于储存液体目标材料的罐，用于在罐中输出液体目标材料的喷嘴和用于将气体供应到罐中的气体供应源，并且以 从设置有压力调节器的气体供给源供给的气体。 目标供给装置还包括其一端连接到罐并且另一端形成排气口的减压气体通道，设置在减压气体通道上的减压阀，以及用于控制开路的控制器 /关闭减压阀。 当目标材料不从喷嘴输出时，控制器打开减压阀并降低罐内的压力。
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公开(公告)号：US10548209B2
公开(公告)日：2020-01-28
申请号：US16261303
申请日：2019-01-29
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara
Abstract: In a chamber apparatus that includes a chamber and a target generation device configured to supply tin as a target material to a certain region in the chamber, oxidation of molten tin is prevented. A chamber apparatus includes: a chamber (1); a target generation device including a tank part (32) configured to store tin T, a variable temperature device (33, 38) configured to change a temperature of the tin T in the tank part (32), a pressure regulator (31) configured to change a pressure in the tank part (32), and a nozzle part (34) configured to eject liquefied tin T; a gas source (40) configured to supply gas containing hydrogen gas into the chamber (1); an evacuation device (46) configured to evacuate gaseous body in the chamber (1); and a controller (2) configured to control generation of a target, in which the controller (2) controls the evacuation device (46) to maintain an oxygen partial pressure in the chamber (1) at 4×10−5 Pa or lower.
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9.发明授权Target supply apparatus, control system, control apparatus and control circuit thereof 有权目标供应装置，控制系统，控制装置及其控制电路公开(公告)号：US09192038B2
公开(公告)日：2015-11-17
申请号：US14047895
申请日：2013-10-07
Applicant: Gigaphoton, Inc. , CKD Corporation
Inventor： Takanobu Ishihara , Hiroshi Itafuji
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
Abstract: A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.
Abstract translation: 目标供给装置包括用于储存液体目标材料的罐，用于在罐中输出液体目标材料的喷嘴和用于将气体供应到罐中的气体供应源，并且以 从设置有压力调节器的气体供给源供给的气体。 目标供给装置还包括其一端连接到罐并且另一端形成排气口的减压气体通道，设置在减压气体通道上的减压阀，以及用于控制开路的控制器 /关闭减压阀。 当目标材料不从喷嘴输出时，控制器打开减压阀并降低罐内的压力。
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公开(公告)号：US20130240645A1
公开(公告)日：2013-09-19
申请号：US13715897
申请日：2012-12-14
Applicant: GIGAPHOTON INC
Inventor： Takanobu Ishihara , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
IPC: B05B1/14
Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
Abstract translation: 目标供给装置可以包括：具有第一材料的圆柱形的罐，用于覆盖罐的圆柱形部分，圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成，第一盖由第二材料形成， 具有通孔，所述第一盖设置在所述圆筒部的轴向的一端，所述第二盖由所述第二材料形成，并且设置在所述圆筒部的轴向的一端的相反侧的另一端，以及 喷嘴，其设置成与所述罐的内部流体连通并且穿过所述通孔，所述喷嘴由所述第一材料形成。
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