Control process and device for treating the surface of a solid substrate
    1.
    发明授权
    Control process and device for treating the surface of a solid substrate 失效
    用于处理固体基材表面的控制方法和装置

    公开(公告)号:US6144898A

    公开(公告)日:2000-11-07

    申请号:US882328

    申请日:1997-06-25

    摘要: A control device for operation of a system for treating a surface of a solid running substrate by dielectric-barrier electrical discharge in a controlled gaseous atmosphere, comprising (A) a system which includes (i) a treatment device through which a substrate to be treated runs at a speed, (ii) the system is connected to the treatment device for supplying the treatment device with a flow of gas, (iii) the system is connected to the treatment device for supplying the treatment device with electrical power in order to produce the electrical discharge and (iv) the system sucking out the gas, (B) a data processing unit capable of receiving, as input, a datum regarding the speed at which the substrate is running through the treatment device, the data processing unit further comprising an output side connected to the system for controlling the electrical power supply system, in order to regulate the flow of gas delivered by the or each of the gas supply system and/or the electrical power delivered by the electrical power supply system to the device as a function of the speed at which the substrate is running through the treatment device, so as to obtain a surface treatment of the substrate with an equivalent quality whatever the speed at which the substrate is running through the treatment.

    摘要翻译: 一种控制装置,用于操作在受控气体气氛中通过电介质阻挡放电来处理固体运行衬底的表面的系统,包括(A)系统,其包括(i)待处理衬底的处理装置 以一定的速度运行,(ii)系统连接到治疗装置以向处理装置提供气体流,(iii)系统连接到治疗装置,以便为治疗装置供电以产生 放电和(iv)系统吸出气体,(B)数据处理单元,其能够接收关于基板运行通过处理装置的速度的数据作为输入,数据处理单元还包括 连接到用于控制电力供应系统的系统的输出侧,以便调节由气体供应系统或每个气体供应系统输送的气体的流量和/或电力d 作为基板通过处理装置运行的速度的函数,由电力供应系统供给到装置,以便以基本运行的速度以相同的质量获得基板的表面处理 通过治疗。

    Control process and device for treating the surface of a solid substrate
    2.
    发明授权
    Control process and device for treating the surface of a solid substrate 失效
    用于处理固体基材表面的控制方法和装置

    公开(公告)号:US6094606A

    公开(公告)日:2000-07-25

    申请号:US882334

    申请日:1997-06-25

    IPC分类号: B05D3/00 B29C59/12 G05D13/00

    摘要: A control device for operation of a system for treating a surface of a solid running substrate by dielectric-barrier electrical discharge in a controlled gaseous atmosphere, comprising (A) a system which includes (i) a treatment device through which a substrate to be treated runs at a speed, (ii) the system is connected to the treatment device for supplying the treatment device with gas, (iii) the system is connected to the device for supplying the treatment device with electrical power in order to produce the electrical discharge and (iv) the system for sucking out the gas (B) a data processing unit designed to receive, as input, a datum regarding the speed at which the substrate is running through the treatment device, the data processing unit being connected, on the output side, to the gas supply system, to the electrical power supply system and to the gas suction system, in order: (a) upon starting the treatment device and when the running speed of the substrate is greater than a predetermined speed, to carry out the following actions: initiate operation of the suction system, initiate operation of the gas supply system, initiate operation of the electrical power supply system, and (b) upon stopping the device and/or when the running speed of the substrate drops to a level below a predetermined speed to carry out the following actions: interrupt operation of the electrical power supply system, interrupt operation of the gas supply system, and interrupt operation of the suction system.

    摘要翻译: 一种控制装置,用于操作在受控气体气氛中通过电介质阻挡放电来处理固体运行衬底的表面的系统,包括(A)系统,其包括(i)待处理衬底的处理装置 以一定的速度运行,(ii)系统连接到用于向处理装置供应气体的处理装置,(iii)系统连接到用于向治疗装置供电以供产生放电的装置, (iv)用于吸出气体的系统(B)数据处理单元,该数据处理单元被设计为接收作为输入的数据处理单元,所述数据处理单元接收与所述基板正在运行的速度相关联的数据处理单元, 一侧,供气系统,供电系统和吸气系统,以:(a)启动处理装置时,当基板的运行速度大于ap 确定速度,执行以下动作:启动吸入系统的运行,启动供气系统的运行,启动供电系统的运行,以及(b)停止设备和/或当运行速度 基板下降到低于预定速度的水平,以执行以下动作:电力供应系统的中断操作,气体供应系统的中断操作和抽吸系统的中断操作。

    Process for combustion of a fuel with an oxygen-rich oxidant
    6.
    发明授权
    Process for combustion of a fuel with an oxygen-rich oxidant 失效
    用富氧氧化剂燃烧燃料的方法

    公开(公告)号:US06190160B1

    公开(公告)日:2001-02-20

    申请号:US09347026

    申请日:1999-07-02

    IPC分类号: F23N102

    摘要: The invention relates to a process for combustion of a fuel with an oxygen-rich oxidant, in a combustion chamber (3), in which, cyclically: at least one principal variable representing the combustion in the said combustion chamber (3) is measured, and, as a function of the result of the measurement of the at least one principal variable, a control instruction for regulating the flowrates of fuel and oxidant to be injected into the combustion chamber (3) is determined. Then the regulating control instruction is applied in order to make the fuel burn with the oxidant in the chamber (3). Additionally at least one secondary variable associated with an operational constraint of the combustion chamber (3) or with a perturbation in the operation of the latter is measured, and for the determination of regulating control instruction, the measurement result of the at least one secondary variable is also taken into account. The invention is useful in glass furnaces, rotary furnaces, and incineration furnaces.

    摘要翻译: 本发明涉及一种在燃烧室(3)中燃烧具有富氧氧化剂的燃料的方法,其中循环地测量表示所述燃烧室(3)中的燃烧的至少一个主要变量, 并且根据所述至少一个主要变量的测量结果的函数,确定用于调节要喷射到所述燃烧室(3)中的燃料和氧化剂的流量的控制指令。 然后施加调节控制指令以使燃料与室(3)中的氧化剂一起燃烧。 此外,测量与燃烧室(3)的操作约束相关的至少一个次级变量,或者与其中的操作中的扰动相关联,并且为了确定调节控制指令,至少一个次级变量的测量结果 也被考虑在内。 本发明可用于玻璃熔炉,旋转炉和焚化炉。