公开(公告)号：US20210332478A1

公开(公告)日：2021-10-28

申请号：US16615060

申请日：2019-04-15

Applicant: Huazhong University of Science and Technology

Inventor： Rong CHEN ,  Jiawei LI ,  Bin SHAN ,  Xiao LIU ,  Kai QU ,  Jing ZHANG

IPC: C23C16/44 ,  C23C16/52 ,  C23C16/455

Abstract: An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.

公开(公告)号：US20180355482A1

公开(公告)日：2018-12-13

申请号：US15978615

申请日：2018-05-14

Applicant: Huazhong University of Science and Technology

Inventor： Rong CHEN ,  Weiming BA ,  Kai QU ,  Yun LI ,  Kun CAO ,  Wei DAN

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45551 ,  C23C16/4417

Abstract: A nanoparticle continuous-coating device based on spatial atomic layer deposition. A first-stage pipeline unit, a second-stage pipeline unit, a third-stage pipeline unit and a fourth-stage pipeline unit which are connected sequentially. The first-stage pipeline unit is used for providing a first precursor and enabling the first precursor to be adsorbed on surfaces of nanoparticles. The third-stage pipeline unit is used for providing a second precursor and enabling the second precursor to react with the first precursor on the surfaces of the nanoparticles, so that a monomolecular thin film layer is generated on the surfaces of the nanoparticles. The second-stage and fourth-stage pipeline units are used for cleaning the nanoparticles and discharging the redundant first precursor, the redundant second precursor or reaction by-products.