公开(公告)号：US20170213651A1

公开(公告)日：2017-07-27

申请号：US15328504

申请日：2015-07-24

Applicant: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) ,  HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Mingkui WANG ,  Kun CAO ,  Jin CUI ,  Zhixiang ZUO ,  Yan SHEN ,  Shaik Mohammad ZAKEERUDDIN ,  Michael GRAETZEL

IPC: H01G9/20 ,  H01L51/44 ,  H01G9/00 ,  H01L51/42

CPC classification number: H01G9/2018 ,  H01G9/0036 ,  H01G9/2022 ,  H01G9/2027 ,  H01G9/209 ,  H01L51/0032 ,  H01L51/422 ,  H01L51/4226 ,  H01L51/4233 ,  H01L51/4293 ,  H01L51/442 ,  H01L51/447 ,  H01L2251/301 ,  H01L2251/305 ,  H01L2251/306 ,  H01L2251/308 ,  Y02E10/549 ,  Y02P70/521

Abstract: The invention discloses a perovskite solar cell and a method of fabrication thereof. The perovskite solar cell sequentially comprises a transparent electrode, a mesoporous P-I-N framework and a counter electrode from the bottom to top; the mesoporous P-I-N framework is composed of an n-type semiconductor layer, an insulating layer, and a p-type semiconductor layer in a sequentially stacked mode, and the n-type semiconductor layer, the insulating layer and the p-type semiconductor layer all comprise mesopores filled with a perovskite material. The preparation method sequentially includes preparing the mesoporous P-I-N framework on a transparent conductive substrate through a spin-coating method or a screen printing method, filling with the perovskite material and preparing the counter electrode layer.

公开(公告)号：US20180355482A1

公开(公告)日：2018-12-13

申请号：US15978615

申请日：2018-05-14

Applicant: Huazhong University of Science and Technology

Inventor： Rong CHEN ,  Weiming BA ,  Kai QU ,  Yun LI ,  Kun CAO ,  Wei DAN

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45551 ,  C23C16/4417

Abstract: A nanoparticle continuous-coating device based on spatial atomic layer deposition. A first-stage pipeline unit, a second-stage pipeline unit, a third-stage pipeline unit and a fourth-stage pipeline unit which are connected sequentially. The first-stage pipeline unit is used for providing a first precursor and enabling the first precursor to be adsorbed on surfaces of nanoparticles. The third-stage pipeline unit is used for providing a second precursor and enabling the second precursor to react with the first precursor on the surfaces of the nanoparticles, so that a monomolecular thin film layer is generated on the surfaces of the nanoparticles. The second-stage and fourth-stage pipeline units are used for cleaning the nanoparticles and discharging the redundant first precursor, the redundant second precursor or reaction by-products.