SEMICONDUCTOR PACKAGE STRUCTURE
    1.
    发明申请

    公开(公告)号:US20220005768A1

    公开(公告)日:2022-01-06

    申请号:US17216686

    申请日:2021-03-30

    Abstract: Provided is a semiconductor package structure including a redistribution layer (RDL) structure, a chip, an electronic device and a stress compensation layer. The RDL structure has a first surface and a second surface opposite to each other. The chip is disposed on the first surface and electrically connected to the RDL structure. The electronic device is disposed in the RDL structure, electrically connected to the chip, and includes a dielectric layer disposed therein. The stress compensation layer is disposed in or outside the RDL structure. The dielectric layer provides a first stress between 50 Mpa and 200 Mpa in a first direction perpendicular to the second surface, the stress compensation layer provides a second stress between 50 Mpa and 200 Mpa in a second direction opposite to the first direction, and the difference between the first stress and the second stress does not exceed 60 Mpa.

    SYSTEM IN PACKAGE STRUCTURE AND ELECTROSTATIC DISCHARGE PROTECTION STRUCTURE THEREOF

    公开(公告)号:US20190355713A1

    公开(公告)日:2019-11-21

    申请号:US16183735

    申请日:2018-11-08

    Abstract: A system in package structure and an electrostatic discharge protection structure thereof are provided. The electrostatic discharge protection structure includes a redistribution layer and a first transistor array. The redistribution layer has a first electrode and a second electrode. The first transistor array is coupled to a pin end of at least one integrated circuit, the first electrode and the second electrode. The first transistor array has a plurality of transistors. A plurality of first transistors of the transistors are coupled in parallel, and a plurality of second transistors of the transistors are coupled in parallel. The first transistors and the second transistors are configured to be turned on for dissipating an electrostatic discharge current.

    CIRCUIT COMPENSATION METHOD APPLIED TO PATTERN DISPLACEMENT AND CIRCUIT STRUCTURE

    公开(公告)号:US20250126722A1

    公开(公告)日:2025-04-17

    申请号:US18916714

    申请日:2024-10-16

    Abstract: A circuit compensation method applied to pattern displacement includes: disposing at least one chip on a carrier; measuring a shift of the chip, performing circuit position compensation on a predetermined pattern of a redistribution layer, and calculating a resistance difference of the pattern before and after the circuit position compensation; estimating a circuit proportion and a range of resistance variation in the pattern needed for resistance compensation after the circuit position compensation according to the resistance difference; determining a compensation position and a scheme of circuit proportion and adjusting a circuit width, area, length, pattern, or combination thereof of a circuit within the circuit proportion according to the resistance difference; outputting a picture file of the pattern after the circuit position and resistance compensation; and forming the redistribution layer according to the picture file and electrically connecting the redistribution layer to the chip. A circuit structure is also provided.

    PHYSIOLOGICAL SENSING DEVICE
    7.
    发明公开

    公开(公告)号:US20240130657A1

    公开(公告)日:2024-04-25

    申请号:US18454074

    申请日:2023-08-23

    CPC classification number: A61B5/27 A61B5/6804

    Abstract: A physiological sensing device for sensing physiological signal of an organism is provided. The physiological sensing device includes a sensing chip, a coupling sensing electrode and a coupling dielectric stacked layer. The coupling sensing electrode is electrically connected to the sensing chip. The coupling dielectric stacked layer covers the coupling sensing electrode. The coupling dielectric stacked layer is located between the coupling sensing electrode and the organism. The coupling dielectric stacked layer includes a first dielectric layer and a second dielectric layer. The dielectric constant of the second dielectric layer is greater than that of the first dielectric layer. The second dielectric layer is located between the first dielectric layer and the organism.

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