公开(公告)号：US20190304794A1

公开(公告)日：2019-10-03

申请号：US16369140

申请日：2019-03-29

Applicant: Innovative Micro Technology

Inventor： Tao Gilbert ,  Sangwoo Kim

IPC: H01L21/308 ,  H01L33/58 ,  H01L31/0232

Abstract: The method described here uses gray scale lithography to form curve surfaces in photoresist. These surfaces can be of arbitrary shape since the remaining resist following exposure and develop is dependent on the exposure dose, which is controlled precisely by the opacity of the photo-mask. The process may include a silicon etch step, followed by a photoresist etch step to form an etching cycle. Each etch cycle may form a pair of substantially orthogonal stepped surfaces, with a characteristic “rise” and “run.”

公开(公告)号：US20170146793A1

公开(公告)日：2017-05-25

申请号：US15355461

申请日：2016-11-18

Applicant: Innovative Micro Technology

Inventor： Christopher S. GUDEMAN ,  Sangwoo Kim ,  Stuart Hutchinson ,  Marin SIGURDSON

IPC: G02B26/08 ,  G03F7/26 ,  G02B1/11 ,  G03F7/20 ,  B81B3/00 ,  B81C1/00

CPC classification number: G03F7/26 ,  B81B7/0067 ,  B81B2201/042 ,  B81B2201/047 ,  B81C2203/0109 ,  G02B1/11 ,  G02B27/0983 ,  G03F7/2004 ,  G03F7/2008 ,  G03F7/201

Abstract: A microfabricated optical apparatus that includes a light source or light detector in combination with an integrated turning surface to form a microfabricated optical subassembly. The integrated turning surface may be formed directly in the substrate material using gray scale lithography.