公开(公告)号：US20140231704A1

公开(公告)日：2014-08-21

申请号：US14261739

申请日：2014-04-25

Applicant: Intermolecular, Inc.

Inventor： Zhi-Wen Sun ,  Nikhil Kalyankar ,  Nitin Kumar ,  Minh Anh Nguyen ,  Sagar Vijay

IPC: H01L31/0236

CPC classification number: H01L31/02366 ,  C23F1/16 ,  H01L31/0236 ,  H01L31/02363 ,  Y02E10/50

Abstract: The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.

Abstract translation: 本公开内容包括包含脂族二醇，碱性化合物和水的纹理制剂，其在适于太阳能电池应用的硅表面上提供一致的纹理区域。 本发明描述了包含至少一种高沸点添加剂的硅纹理配方。 高沸点添加剂可以是丙二醇或乙二醇的衍生化合物的衍生化合物。 还描述了使用这些制剂对晶体硅衬底进行纹理化的工艺。 另外，描述了优化结晶硅衬底的纹理表面的组合方法。

公开(公告)号：US09099582B2

公开(公告)日：2015-08-04

申请号：US14261739

申请日：2014-04-25

Applicant: Intermolecular, Inc.

Inventor： Zhi-Wen Sun ,  Nikhil Kalyankar ,  Nitin Kumar ,  Minh Anh Nguyen ,  Sagar Vijay

IPC: C09K13/02 ,  H01L31/0236 ,  C23F1/16

CPC classification number: H01L31/02366 ,  C23F1/16 ,  H01L31/0236 ,  H01L31/02363 ,  Y02E10/50

Abstract: The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.

Abstract translation: 本公开内容包括包含脂族二醇，碱性化合物和水的纹理制剂，其在适于太阳能电池应用的硅表面上提供一致的纹理区域。 本发明描述了包含至少一种高沸点添加剂的硅纹理配方。 高沸点添加剂可以是丙二醇或乙二醇的衍生化合物的衍生化合物。 还描述了使用这些制剂对晶体硅衬底进行纹理化的工艺。 另外，描述了优化结晶硅衬底的纹理表面的组合方法。