Method for IC wiring yield optimization, including wire widening during and after routing
    1.
    发明授权
    Method for IC wiring yield optimization, including wire widening during and after routing 有权
    IC布线产量优化方法,包括布线期间和之后的线宽

    公开(公告)号:US08230378B2

    公开(公告)日:2012-07-24

    申请号:US12572297

    申请日:2009-10-02

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5077

    摘要: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

    摘要翻译: 公开了用于为设计执行屈服感知IC路由的方法,服务和计算机程序产品的实施例。 该方法执行满足布线拥塞约束的初始全局路由。 接下来,该方法基于例如二次拥塞优化来逐层地在全局路由上执行线扩展和线拓宽。 之后,使用电线扩展和线宽加工的结果,在全局路线上执行定时关闭。 使用关键区域产量模型进行布线后布线宽度和布线调整。 此外,该方法允许优化已经路由的数据。

    METHOD FOR IC WIRING YIELD OPTIMIZATION, INCLUDING WIRE WIDENING DURING AND AFTER ROUTING
    2.
    发明申请
    METHOD FOR IC WIRING YIELD OPTIMIZATION, INCLUDING WIRE WIDENING DURING AND AFTER ROUTING 有权
    IC接线优化方法,包括在路由和之后的线路宽带化

    公开(公告)号:US20100023913A1

    公开(公告)日:2010-01-28

    申请号:US12572297

    申请日:2009-10-02

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5077

    摘要: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

    摘要翻译: 公开了用于为设计执行屈服感知IC路由的方法,服务和计算机程序产品的实施例。 该方法执行满足布线拥塞约束的初始全局路由。 接下来,该方法基于例如二次拥塞优化来逐层地在全局路由上执行线扩展和线拓宽。 之后,使用电线扩展和线宽加工的结果,在全局路线上执行定时关闭。 使用关键区域产量模型进行布线后布线宽度和布线调整。 此外,该方法允许优化已经路由的数据。

    Method for IC wiring yield optimization, including wire widening during and after routing
    3.
    发明授权
    Method for IC wiring yield optimization, including wire widening during and after routing 失效
    IC布线产量优化方法,包括布线期间和之后的线宽

    公开(公告)号:US07657859B2

    公开(公告)日:2010-02-02

    申请号:US11275076

    申请日:2005-12-08

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5077

    摘要: Disclosed are embodiments of a method, service, and computer program product for performing yield-aware IC routing for a design. The method performs an initial global routing which satisfies wiring congestion constraints. Next, the method performs wire spreading and wire widening on the global route, layer by layer, based on, for example, a quadratic congestion optimization. Following this, timing closure is performed on the global route using results of the wire spreading and wire widening. Post-routing wiring width and wire spreading adjustments are made using the critical area yield model. In addition, the method allows for the optimization of already-routed data.

    摘要翻译: 公开了用于为设计执行屈服感知IC路由的方法,服务和计算机程序产品的实施例。 该方法执行满足布线拥塞约束的初始全局路由。 接下来,该方法基于例如二次拥塞优化来逐层地在全局路由上执行线扩展和线拓宽。 之后,使用电线扩展和线宽加工的结果,在全局路线上执行定时关闭。 使用关键区域产量模型进行布线后布线宽度和布线调整。 此外,该方法允许优化已经路由的数据。

    Use of a layout-optimization tool to increase the yield and reliability of VLSI designs
    4.
    发明授权
    Use of a layout-optimization tool to increase the yield and reliability of VLSI designs 失效
    使用布局优化工具来提高VLSI设计的产出和可靠性

    公开(公告)号:US06941528B2

    公开(公告)日:2005-09-06

    申请号:US10604962

    申请日:2003-08-28

    IPC分类号: G06F9/45 G06F17/50

    CPC分类号: G06F17/5068

    摘要: The invention provides a method and structure for optimizing placement of redundant vias within an integrated circuit design. The invention first locates target vias by determining which vias do not have a redundant via. Then, the invention draws marker shapes on or adjacent to the target vias. The marker shapes are only drawn in a horizontal or vertical direction from each of the target vias. The invention simultaneously expands all of the marker shapes in the first direction to a predetermined length or until the marker shapes reach the limits of a ground rule. During the expanding, different marker shapes will be expanded to different lengths. The invention determines which of the marker shapes were expanded sufficiently to form a valid redundant via to produce a first set of potential redundant vias and the invention eliminates marker shapes that could not be expanded sufficiently to form a valid redundant via.

    摘要翻译: 本发明提供了一种用于优化集成电路设计中的冗余通孔的布置的方法和结构。 本发明首先通过确定哪些通孔没有冗余通孔来定位目标通孔。 然后,本发明在目标通孔上或附近绘制标记物形状。 标记形状仅在每个目标通孔的水平或垂直方向绘制。 本发明同时将第一方向上的所有标记形状扩展到预定长度,或者直到标记形状达到接地规则的极限。 在扩展期间,不同的标记形状将被扩展到不同的长度。 本发明确定哪些标记形状被充分扩展以形成有效的冗余通路以产生第一组潜在的冗余通孔,并且本发明消除了不能充分扩展以形成有效的冗余通路的标记形状。

    Systematic yield in semiconductor manufacture
    5.
    发明授权
    Systematic yield in semiconductor manufacture 失效
    半导体制造系统产量

    公开(公告)号:US07721240B2

    公开(公告)日:2010-05-18

    申请号:US11966135

    申请日:2007-12-28

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, structures built on a layer above the lower layer are formed on a more planar surface and thus are more likely to function properly. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.

    摘要翻译: 提供三维结构,其提高半导体器件中某些结构的制造成品率。 三维结构考虑到上层和下层之间的相互作用,其中下层由于其设计而具有形成非平面表面的倾向。 因此,构建在下层上方的层上的结构形成在更平坦的表面上,因此更有可能正常地起作用。 提高制造产量的变化是在设计阶段而不是在制造阶段进行的。

    Method and system for obtaining a feasible integer solution from a half-integer solution in hierarchical circuit layout optimization
    6.
    发明授权
    Method and system for obtaining a feasible integer solution from a half-integer solution in hierarchical circuit layout optimization 有权
    在分层电路布局优化中从半整数解求解可行整数解的方法和系统

    公开(公告)号:US07062729B2

    公开(公告)日:2006-06-13

    申请号:US10946677

    申请日:2004-09-22

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: A method (300) and system (500) for optimizing a circuit layout based on layout constraints (308) and objectives (312). The method includes solving a linear program so as to obtain a rational solution whose variables are either whole or half integer. The tight constraints and objectives involving variables whose solution are a half integer are reduced to a 2-SAT problem, which is analyzed to determine its satisfiability. If the 2-SAT problem is not satisfiable, one or more objectives are removed so as to make the 2-SAT problem satisfiable. Any half-integer results of the linear program are rounded according to the truth assignment that satisfies the 2-SAT problem. The rounded results are used to create the circuit layout.

    摘要翻译: 一种用于基于布局约束(308)和目标(312)优化电路布局的方法(300)和系统(500)。 该方法包括求解线性程序,以获得变量为整数或整数的理性解。 解决方案为半整数的变量的严格约束和目标简化为2-SAT问题,进行分析以确定其可满足性。 如果2-SAT问题不可满足,则删除一个或多个目标,以使2-SAT问题满足。 线性程序的任何半整数结果根据满足2-SAT问题的真值赋值进行舍入。 圆形的结果用于创建电路布局。

    Systematic yield in semiconductor manufacture
    7.
    发明授权
    Systematic yield in semiconductor manufacture 有权
    半导体制造系统产量

    公开(公告)号:US07337415B2

    公开(公告)日:2008-02-26

    申请号:US10711978

    申请日:2004-10-18

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, design changes are performed to make structures more likely to function, either by forming a more planar surface on the lower layer or by compensating in the upper layer for the lack of planarity. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.

    摘要翻译: 提供三维结构,其提高半导体器件中某些结构的制造成品率。 三维结构考虑到上层和下层之间的相互作用,其中下层由于其设计而具有形成非平面表面的倾向。 因此,通过在下层上形成更平坦的表面或者通过在上层补偿缺乏平面性,进行设计变更以使结构更有可能起作用。 提高制造产量的变化是在设计阶段而不是在制造阶段进行的。

    Systematic yield in semiconductor manufacture
    8.
    发明授权
    Systematic yield in semiconductor manufacture 失效
    半导体制造系统产量

    公开(公告)号:US07725864B2

    公开(公告)日:2010-05-25

    申请号:US11854000

    申请日:2007-09-12

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068

    摘要: Three-dimensional structures are provided which improve manufacturing yield for certain structures in semiconductor devices. The three-dimensional structures take into account the interaction between an upper layer and a lower layer where the lower layer has a tendency to form a non-planar surface due to its design. Accordingly, design changes are performed to make structures more likely to function, either by forming a more planar surface on the lower layer or by compensating in the upper layer for the lack of planarity. The changes to improve manufacturing yield are made at the design stage rather than at the fabrication stage.

    摘要翻译: 提供三维结构,其提高半导体器件中某些结构的制造成品率。 三维结构考虑到上层和下层之间的相互作用,其中下层由于其设计而具有形成非平面表面的倾向。 因此,通过在下层上形成更平坦的表面或者通过在上层补偿缺乏平面性,进行设计变更以使结构更有可能起作用。 提高制造产量的变化是在设计阶段而不是在制造阶段进行的。

    Use of redundant routes to increase the yield and reliability of a VLSI layout
    10.
    发明授权
    Use of redundant routes to increase the yield and reliability of a VLSI layout 有权
    使用冗余路由来提高VLSI布局的收益和可靠性

    公开(公告)号:US07308669B2

    公开(公告)日:2007-12-11

    申请号:US10908593

    申请日:2005-05-18

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5077 G06F17/5068

    摘要: Disclosed is a method and system for inserting redundant paths into an integrated circuit. Particularly, the invention provides a method for identifying a single via in a first path connecting two elements, determining if an alternate route is available for connecting the two elements (other than a redundant via), and for inserting a second path into the available alternate route. The combination of the first and second paths provides greater redundancy than inserting a redundant via alone. More importantly, such redundant paths provide for redundancy when congestion prevents a redundant via from being inserted adjacent to the single via. An embodiment of the method further comprises removing the single via and any redundant wire segments, if all of the additional vias used to form the second path can be made redundant.

    摘要翻译: 公开了一种将冗余路径插入到集成电路中的方法和系统。 特别地,本发明提供了一种用于在连接两个元件的第一路径中识别单个通孔的方法,确定替代路线是否可用于连接两个元件(不同于冗余通路),以及用于将第二路径插入到可用替代 路线。 第一和第二路径的组合提供了比单独插入冗余通道更大的冗余。 更重要的是,当拥塞阻止冗余通道被插入邻近单个通道时,这种冗余路径提供了冗余。 如果用于形成第二路径的所有附加通孔都可以是冗余的,则该方法的实施例还包括去除单个通孔和任何冗余线段。