公开(公告)号：US20190004439A1

公开(公告)日：2019-01-03

申请号：US16122495

申请日：2018-09-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/47 ,  G02B27/42

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20180342063A1

公开(公告)日：2018-11-29

申请号：US15757119

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G06T7/13 ,  G06K9/00

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20190033726A1

公开(公告)日：2019-01-31

申请号：US15753187

申请日：2017-12-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Ido Adam ,  Vladimir LEVINSKI ,  Amnon MANASSEN ,  Yuval LUBASHEVSKY

IPC: G03F7/20

Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity—to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.