公开(公告)号：US20200158492A1

公开(公告)日：2020-05-21

申请号：US16665759

申请日：2019-10-28

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/956 ,  G01N21/95 ,  G06F30/398 ,  G06F30/392

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US20160178351A1

公开(公告)日：2016-06-23

申请号：US14949444

申请日：2015-11-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran AMIT ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G06F17/50 ,  G01B11/27

CPC classification number: G01B11/06 ,  G01B11/272 ,  G01B2210/56 ,  G01B2290/70 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  G06F17/5072 ,  G06F17/5081 ,  H01L22/30

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

Abstract translation: 提供了目标，目标元素和目标设计方法，其包括将目标结构设计为具有高于特定对比度阈值的高对比度至其偏振光背景，同时具有低于特定对比度阈值至其非极化背景下的特定对比度阈值的低对比度 光。 目标可能在设备特征尺度上具有细节，并且与设备设计规则兼容，并且当用偏振照明测量时保持光学对比度，并且因此被有效地用作计量目标。 同样提供了设计变型和相应的测量光学系统。

公开(公告)号：US20190033726A1

公开(公告)日：2019-01-31

申请号：US15753187

申请日：2017-12-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Ido Adam ,  Vladimir LEVINSKI ,  Amnon MANASSEN ,  Yuval LUBASHEVSKY

IPC: G03F7/20

Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity—to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.

公开(公告)号：US20160025646A1

公开(公告)日：2016-01-28

申请号：US14875084

申请日：2015-10-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Amnon MANASSEN ,  Andrew HILL ,  Avi ABRAMOV

IPC: G01N21/88 ,  G01N21/47

CPC classification number: G01N21/8806 ,  G01J1/0228 ,  G01J3/02 ,  G01J3/021 ,  G01J3/0218 ,  G01J3/0229 ,  G01J3/2823 ,  G01N21/47 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/8848 ,  G01N2201/06 ,  G03F7/70633

Abstract: Methods and systems are provided, which pattern an illumination of a metrology target with respect to spectral ranges and/or polarizations, illuminate a metrology target by the patterned illumination, and measure radiation scattered from the target by directing, at a pupil plane, selected pupil plane pixels from a to respective single detector(s) by applying a collection pattern to the pupil plane pixels. Single detector measurements (compressive sensing) has increased light sensitivity which is utilized to pattern the illumination and further enhance the information content of detected scattered radiation with respect to predefined metrology parameters.

Abstract translation: 提供了方法和系统，其对于光谱范围和/或偏振来对计量目标进行照明，通过图案化照明照亮度量目标，并且通过在瞳孔平面指导所选择的瞳孔来测量从目标散射的辐射 通过将收集图案应用于瞳孔平面像素，从一个或多个单个检测器的平面像素。 单个检测器测量（压缩感测）具有增加的光敏度，其用于对照明进行图案化，并且相对于预定义的度量参数进一步增强检测到的散射辐射的信息内容。

公开(公告)号：US20190004439A1

公开(公告)日：2019-01-03

申请号：US16122495

申请日：2018-09-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/47 ,  G02B27/42

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20180342063A1

公开(公告)日：2018-11-29

申请号：US15757119

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G06T7/13 ,  G06K9/00

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20150116717A1

公开(公告)日：2015-04-30

申请号：US14581719

申请日：2014-12-23

Applicant: Kla-Tencor Corporation

Inventor： Amnon MANASSEN ,  Andrew HILL ,  Daniel KANDEL ,  Ilan SELA ,  Ohad BACHAR ,  Barak BRINGOLTZ

IPC: G01N21/55 ,  G01B11/00

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

Abstract translation: 提供了角度分辨反射计和反射测量方法，其包括相干光源，光学系统布置成使用来自光源的相干光的光点扫描测试图案，以产生收集的瞳孔中的光分布的实现，其中 斑点覆盖测试图案的一部分，并且根据扫描图案光学地或机械地执行扫描;以及处理单元，被配置为通过组合瞳孔图像来生成收集的瞳孔分布的合成图像。 提供了测量系统和方法，其通过估计定量地测量参数对孔径尺寸的功能依赖性并且从与孔径尺寸相关的功能依赖性的识别的衍射分量推导出测量参数的校正项，从而降低衍射误差， 相对于测量条件。