公开(公告)号：US20190004439A1

公开(公告)日：2019-01-03

申请号：US16122495

申请日：2018-09-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/47 ,  G02B27/42

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20180342063A1

公开(公告)日：2018-11-29

申请号：US15757119

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G06T7/13 ,  G06K9/00

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.