公开(公告)号：US10897566B2

公开(公告)日：2021-01-19

申请号：US15562556

申请日：2017-08-25

Applicant: KLA-Tencor Corporation

Inventor： Nadav Gutman ,  Boris Golovanevsky ,  Noam Gluzer

IPC: B29C64/20 ,  B29C64/30 ,  B29C64/393 ,  B29C64/268 ,  B29C64/386 ,  B33Y10/00 ,  B33Y50/02 ,  B33Y30/00 ,  B33Y40/00 ,  B29C64/153 ,  B22F3/105 ,  B22F3/00 ,  B29C64/295 ,  B29C64/264 ,  H04N5/232 ,  G02B21/00 ,  G02B21/24 ,  G02B21/36 ,  G03B13/36 ,  G03F7/20

Abstract: Focusing methods and modules are provided for metrology tools and systems. Methods comprise capturing image(s) of at least two layers of a ROI in an imaging target, binning the captured image(s), deriving a focus shift from the binned captured image(s) by comparing the layers, and calculating a focus position from the derived focus shift. Disclosed methods are direct, may be carried out in parallel to a part of the overlay measurement process and provide fast and simple focus measurements that improve metrology performance.