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公开(公告)号：US20180232478A1
公开(公告)日：2018-08-16
申请号：US15509728
申请日：2017-01-06
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
CPC classification number: G06F17/5068 , G03F7/70508 , G03F7/70633 , G03F7/70683
Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
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公开(公告)号：US09970886B2
公开(公告)日：2018-05-15
申请号：US14569043
申请日：2014-12-12
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
IPC: G01N21/00 , G01N21/95 , H01L21/687
CPC classification number: G01N21/9501 , G01N2201/02 , H01L21/68764 , Y10T29/49
Abstract: Metrology tool stage configurations and respective methods are provided, which comprise a pivoted connection arranged to receive a wafer and enable rotation thereof about a pivot; a radial axis arranged to radially move the rotatable pivoted connection attached thereto; and optics having a stationary part configured to generate a collimated illumination beam. For example, the optics may be stationary and the radial axis may be centrally rotated to enable stage operation without requiring additional space for guiding systems. In another example, a part of the optics may be rotatable, when configured to receive illumination via a mechanically decoupled or empty region, receive power and control wirelessly and deliver data wirelessly. The disclosed configurations provide more compact and more robust stages which efficiently handle large wafers. Stage configurations may be horizontal or vertical, the latter further minimizing the tool's footprint.
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公开(公告)号：US20190286781A1
公开(公告)日：2019-09-19
申请号：US16431330
申请日：2019-06-04
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
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公开(公告)号：US10897566B2
公开(公告)日：2021-01-19
申请号：US15562556
申请日：2017-08-25
Applicant: KLA-Tencor Corporation
Inventor： Nadav Gutman , Boris Golovanevsky , Noam Gluzer
IPC: B29C64/20 , B29C64/30 , B29C64/393 , B29C64/268 , B29C64/386 , B33Y10/00 , B33Y50/02 , B33Y30/00 , B33Y40/00 , B29C64/153 , B22F3/105 , B22F3/00 , B29C64/295 , B29C64/264 , H04N5/232 , G02B21/00 , G02B21/24 , G02B21/36 , G03B13/36 , G03F7/20
Abstract: Focusing methods and modules are provided for metrology tools and systems. Methods comprise capturing image(s) of at least two layers of a ROI in an imaging target, binning the captured image(s), deriving a focus shift from the binned captured image(s) by comparing the layers, and calculating a focus position from the derived focus shift. Disclosed methods are direct, may be carried out in parallel to a part of the overlay measurement process and provide fast and simple focus measurements that improve metrology performance.
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公开(公告)号：US09581430B2
公开(公告)日：2017-02-28
申请号：US14057827
申请日：2013-10-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Ohad Bachar , Daria Negri , Boris Golovanevsky , Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01B9/0209 , G01B9/02027 , G01B9/02043 , G01B9/02087 , G01N21/45
Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。
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Patent Agency Ranking
公开(公告)号：US20150233814A1
公开(公告)日：2015-08-20
申请号：US14361610
申请日：2014-03-28
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky , Noam Sapiens
CPC classification number: G01N21/01 , F16F7/01 , F16F9/306 , F16F15/02 , F16F15/023 , F16F15/04 , G01N21/9501 , G01N2201/025 , G10K11/1785 , G10K11/17873 , G10K2210/10 , G10K2210/129
Abstract: Metrology tools are provided, which comprise both active and passive vibration isolation devices, passive or active isolation systems such as constrained layer dampers, particle impact dampers or liquid impact dampers, and/or noise cancellation transducers, combined in different supporting structures of the metrology tool to dampen and reduce vibrations at a wide range of frequencies and intensities, and to which frequency range spectral analysis and optimization may be applied to determine specific tool configurations according to the provided principles.
Abstract translation: 提供了计量工具，其包括主动和被动隔振装置，被动或主动隔离系统，例如约束层阻尼器，颗粒撞击阻尼器或液体冲击阻尼器，和/或噪声消除换能器，组合在计量工具的不同支撑结构中 以便在宽范围的频率和强度下抑制和减少振动，并且根据所提供的原理，可以应用哪个频率范围的频谱分析和优化来确定具体的工具配置。
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公开(公告)号：US20150098081A1
公开(公告)日：2015-04-09
申请号：US14569043
申请日：2014-12-12
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
CPC classification number: G01N21/9501 , G01N2201/02 , H01L21/68764 , Y10T29/49
Abstract: Metrology tool stage configurations and respective methods are provided, which comprise a pivoted connection arranged to receive a wafer and enable rotation thereof about a pivot; a radial axis arranged to radially move the rotatable pivoted connection attached thereto; and optics having a stationary part configured to generate a collimated illumination beam. For example, the optics may be stationary and the radial axis may be centrally rotated to enable stage operation without requiring additional space for guiding systems. In another example, a part of the optics may be rotatable, when configured to receive illumination via a mechanically decoupled or empty region, receive power and control wirelessly and deliver data wirelessly. The disclosed configurations provide more compact and more robust stages which efficiently handle large wafers. Stage configurations may be horizontal or vertical, the latter further minimizing the tool's footprint.
Abstract translation: 提供了计量工具台结构和各自的方法，其包括布置成接收晶片并使其绕枢轴旋转的枢转连接; 径向轴线，其布置成径向移动附接到其上的可旋转枢转连接; 以及具有被配置为产生准直照明光束的静止部分的光学器件。 例如，光学器件可以是静止的，并且径向轴线可以被中心旋转以使得能够进行平台操作，而不需要用于引导系统的额外的空间。 在另一示例中，当被配置为经由机械解耦或空区域接收照明时，光学部件的一部分可以是可旋转的，以无线方式接收功率和控制并且传送数据。 所公开的配置提供了更有效地处理大晶片的更紧凑和更坚固的阶段。 舞台配置可以是水平的或垂直的，后者进一步最小化工具的占地面积。
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公开(公告)号：US10755016B2
公开(公告)日：2020-08-25
申请号：US16431330
申请日：2019-06-04
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
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公开(公告)号：US10354035B2
公开(公告)日：2019-07-16
申请号：US15509728
申请日：2017-01-06
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky
Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
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公开(公告)号：US09546946B2
公开(公告)日：2017-01-17
申请号：US14361610
申请日：2014-03-28
Applicant: KLA-Tencor Corporation
Inventor： Boris Golovanevsky , Noam Sapiens
CPC classification number: G01N21/01 , F16F7/01 , F16F9/306 , F16F15/02 , F16F15/023 , F16F15/04 , G01N21/9501 , G01N2201/025 , G10K11/1785 , G10K11/17873 , G10K2210/10 , G10K2210/129
Abstract: Metrology tools are provided, which comprise both active and passive vibration isolation devices, passive or active isolation systems such as constrained layer dampers, particle impact dampers or liquid impact dampers, and/or noise cancellation transducers, combined in different supporting structures of the metrology tool to dampen and reduce vibrations at a wide range of frequencies and intensities, and to which frequency range spectral analysis and optimization may be applied to determine specific tool configurations according to the provided principles.
Abstract translation: 提供了计量工具，其包括主动和被动隔振装置，被动或主动隔离系统，例如约束层阻尼器，颗粒撞击阻尼器或液体冲击阻尼器，和/或噪声消除换能器，组合在计量工具的不同支撑结构中 以便在宽范围的频率和强度下抑制和减少振动，并且根据所提供的原理，可以应用哪个频率范围的频谱分析和优化来确定具体的工具配置。
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