公开(公告)号：US20150192463A1

公开(公告)日：2015-07-09

申请号：US14225698

申请日：2014-03-26

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Young Min JHON ,  Yong Soo KIM ,  Min Ah SEO ,  Jae Hun KIM ,  Min Chul PARK ,  Sun Ho KIM ,  Deok Ha WOO ,  Seok LEE ,  Taik Jin LEE ,  Myung Suk CHUN ,  Woon Jo CHO

IPC: G01J3/02

CPC classification number: G01J3/0297 ,  G01J3/28 ,  G03F7/70516 ,  G03F7/70575 ,  G03F7/70616

Abstract: Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.

Abstract translation: 提供了一种用于校准极紫外（EUV）光谱仪的装置和方法，其中可以精确地测量用于EUV光刻和掩模检查技术的EUV光的光谱的波长。