摘要:
A user wears a virtual reality mask (VR mask) (100) and then watches a virtual reality image. The VR mask (100) blocks light incident from the outside. When the user wears the VR mask (100), the user cannot discover an obstacle (500) positioned outside the VR mask (100). The user may collide with the obstacle (500) and may be injured by the obstacle (500). Accordingly, in order to prevent injury to the user who uses the VR mask (100), it is necessary to make the user recognize the obstacle (500) positioned outside the VR mask (100). In order to recognize an obstacle, a virtual reality image and the obstacle may be displayed together, or the amount of light incident from the outside may be adjusted.
摘要:
Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.
摘要:
Provided is a single pulse laser apparatus. The apparatus including a resonator having a first mirror, a second mirror, a gain medium, and electro-optic modulators (EOMs) which perform each mode-locking and Q-switching, the apparatus includes a photodiode which measures laser light that oscillates from the resonator, a synchronizer which converts an electrical signal generated by measuring the laser light into a transistor-transistor logic (TTL) signal, a delay unit which sets a latency determined in order to synchronize a mode-locked pulse with a Q-switched pulse to the TTL signal, and outputs a trigger TTL signal according to the latency, and a Q-driver which inputs the trigger TTL signal to the EOM which performs Q-switching, and causes the EOM to operates.
摘要:
Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.
摘要:
Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.