公开(公告)号：US20210057241A1

公开(公告)日：2021-02-25

申请号：US16941661

申请日：2020-07-29

Applicant: Kioxia Corporation

Inventor： Yuji HASHIMOTO ,  Shinsuke Muraki ,  Hiroaki Yamada

IPC: H01L21/67 ,  B08B3/08 ,  B08B13/00 ,  B08B3/10

Abstract: According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

公开(公告)号：US20220068673A1

公开(公告)日：2022-03-03

申请号：US17198728

申请日：2021-03-11

Applicant: Kioxia Corporation

Inventor： Satoshi NAKAOKA ,  Yuji HASHIMOTO ,  Hiroshi FUJITA

IPC: H01L21/67 ,  H01L21/311

Abstract: A substrate treatment apparatus according to an embodiment includes: a tank configured to store a liquid chemical with which a plurality of substrates are treated; a piping having an ejection port that ejects the liquid chemical or bubbles into the tank; a plurality of rods that support the plurality of substrates in the tank; and a converter that is provided in the plurality of rods or the tank and that converts vibration applied to each substrate by the liquid chemical or the bubbles ejected from the piping into rotation in one direction around a center of the substrate as a rotational axis.